Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1267-1276

  Wang, Qi Min ^a,b   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CAVITY RESONATORS; CHEMICAL PROPERTIES; CHROMIUM; ION BOMBARDMENT; ION IMPLANTATION; IONS; MECHANICAL PROPERTIES; MICROSTRUCTURE; NITRIDES; PHASE STRUCTURE; PLATING; REGULATORY COMPLIANCE; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS;

NEGATIVE BIAS;

STRUCTURE (COMPOSITION);

EID: 50849092859     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2966434     Document Type: Article

References (35)

1. I. Petrov, V. Orlinov, I. Ivanov, and J. Kourtev, Contrib. Plasma Phys. 28, 2 (1988).
2. P. H. Mayrhofer, F. Kunc, J. Musil, and C. Mitterer, Thin Solid Films 415, 151 (2002).
3. Q. M. Wang and K. H. Kim, J. Vac. Sci. Technol. A 26, 1258 (2008).
4. C. H. Ma, J. H. Huang, and H. Chen, Surf. Coat. Technol. 200, 3868 (2006).
5. S. Yamamoto and H. Ichimuta, J. Mater. Res. 11, 1149 (1996).
6. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
7. C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin Elmer Corporation, Eden Prairie, 1979.
8. M. Romand and M. Roubin, Analysis 4, 309 (1976).
9. I. Petrov and J. E. Greene, Surf. Sci. Spectra 7, 250 (2000).
10. E. Desimoni, C. Malitesta, P. G. Zambonin, and J. C. Riviere, Surf. Interface Anal. 13, 173 (1988).
11. I. Ikemoto, K. Ishi, S. Kimoshita, H. Kuroda, M. A. A. Franco, and J. M. J. Thomas, Solid State Chem. 17, 425 (1976).
12. A. Lippitz and T. Hubert, Surf. Coat. Technol. 200, 250 (2005).
13. C. M. Abreu, M. J. Cristóbal, X. R. Nóvoa, G. Pena, and M. C. Ṕrez, Surf. Interface Anal. 38, 851 (2006).
14. A. Conde, A. B. Cristóbal, G. Fuentes, T. Tate, and J. de Damborenea, Surf. Coat. Technol. 201, 3588 (2006).
15. M. Od́n, J. Almer, and G. Hkansson, Surf. Coat. Technol. 120/121, 272 (1999).
16. H. O. Nakazato, K. Taguchi, K. Tamura, Y. Tomatsu, and T. Usui, Metall. Mater. Trans. B 32, 1113 (2001).
17. C. H́au, R. Y. Fillit, F. Vaux, and F. Pascaretti, Surf. Coat. Technol. 120/121, 200 (1999).
18. J. Almer, M. Od́n, L. Hultman, and G. Hkansson, J. Vac. Sci. Technol. A 120/121, 272 (1999).
19. C. Gautier and J. Machet, Thin Solid Films 295, 43 (1997).
20. J. J. Olaya, S. E. Rodil, S. Muhl, and L. Huerta, Surf. Coat. Technol. 200, 5743 (2006).
21. C. Bergman, Surf. Coat. Technol. 36, 243 (1988).
22. S. Mahieu, P. Ghekiere, D. Depla, and R. De Gryse, Thin Solid Films 515, 1229 (2006).
23. J. P. Zhao, X. Wang, and Z. Y. Chen, J. Phys. D: Appl. Phys. 30, 5 (1997).
24. J. Pelleg, L. Z. Zevin, S. Lungo, and N. Croitoru, Thin Solid Films 197, 117 (1991).
25. A. van der Drift, Philips Res. Rep. 22, 267 (1967).
26. P. J. Martin, A. Bendavid, and T. J. Kinder, Surf. Coat. Technol. 81, 36 (1996).
27. T. H. Lee, C. S. Oh, H. N. Han, C. G. Lee, S. J. Kim, and S. Takaki, Acta Crystallogr., Sect. B: Struct. Sci. 61, 137 (2005).
28. G. Carter, J. Phys. D: Appl. Phys. 27, 1046 (1994).
29. G. C. A. M. Janssen, Thin Solid Films 515, 6654 (2007).
30. C. A. Davis, Thin Solid Films 226, 30 (1993).
31. P. H. Mayrhofer, C. Mitterer, L. Hultman, and H. Clemens, Prog. Mater. Sci. 51, 1032 (2006).
32. J. J. Olaya, G. Wei, S. E. Rodil, S. Muhl, and B. Bhushan, Vacuum 81, 610 (2007).
33. J. C. Sánchez-López, D. Martínez-Martínez, C. López-Cartes, A. Fernández, M. Brizuela, A. García-Luis, and J. I. Oate, J. Vac. Sci. Technol. A 23, 681 (2005).
34. P. H. Mayrhofer, C. Mitterer, and J. Musil, Surf. Coat. Technol. 174/175, 725 (2003).
35. http://www.matsci.ucdavis.edu/MatSciLT/EMS-174L/Files/HallPetch.pdf