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Applied Physics Letters

Volumn 95, Issue 8, 2009, Pages

Interconnected Si nanocrystals forming thin films with controlled bandgap values

(4) Nychyporuk, T a Zakharko, Yu a Lysenko, V a Lemiti, M a

a UNIVERSITÉ DE LYON (France)

Author keywords

[No Author keywords available]

Indexed keywords

BAND-GAP VALUES; DUSTY PLASMAS; HOMOGENEOUS THIN FILM; NANOCRYSTALLINE SI; NANOPARTICLE GROWTHS; NANOSTRUCTURED FILMS; PLASMA DURATION; PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SI NANOCRYSTAL; STRUCTURAL AND OPTICAL PROPERTIES; TANDEM SOLAR CELLS;

CELL MEMBRANES; DEPOSITION; DUST; ENERGY GAP; INTERCONNECTION NETWORKS; NANOCRYSTALS; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMA THEORY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 69549130890 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3216072 Document Type: Article

Times cited : (7)

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