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Volumn 196, Issue 23, 2011, Pages 10228-10233

Structural, morphological and electrochemical properties of nanocrystalline V2O5 thin films deposited by means of radiofrequency magnetron sputtering

(4) Quinzeni, I a Ferrari, S a Quartarone, E a Mustarelli, P a

a UNIVERSITY OF PAVIA (Italy)

Author keywords

Lithium microbattery; r.f. magnetron sputtering; Thin films; V2O5

Indexed keywords

ALL-SOLID-STATE; CATHODE MATERIALS; CRYSTALLINE THIN FILMS; CRYSTALLOGRAPHIC ORIENTATIONS; DEPOSITION PARAMETERS; DEPOSITION TECHNIQUE; DEPOSITION TIME; ELECTROCHEMICAL PERFORMANCE; FILM MICROSTRUCTURES; HIGH ENERGY DENSITIES; HIGH SPECIFIC CAPACITY; LI INTERCALATION; LITHIUM MICRO-BATTERY; LITHIUM MICROBATTERIES; MORPHOLOGICAL FEATURES; NANOCRYSTALLINE THIN FILMS; NANOCRYSTALLINES; OPEN PROBLEMS; POTENTIAL RANGE; PREFERENTIAL GROWTH; R.F. MAGNETRON SPUTTERING; RADIO FREQUENCIES; RADIO FREQUENCY MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; XRD; XRD ANALYSIS;

ATOMIC FORCE MICROSCOPY; CATHODES; DEPOSITION; ELECTROCHEMICAL PROPERTIES; LITHIUM; MAGNETRON SPUTTERING; NANOCRYSTALLINE MATERIALS; THIN FILMS; VANADIUM; VAPOR DEPOSITION; X RAY POWDER DIFFRACTION;

FILM PREPARATION;

EID: 80053564720 PISSN: 03787753 EISSN: None Source Type: Journal
DOI: 10.1016/j.jpowsour.2011.08.073 Document Type: Article

Times cited : (36)

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