Structural characterization of β-V 2 O 5 films prepared by DC reactive magnetron sputtering

Applied Surface Science

Volumn 255, Issue 7, 2009, Pages 4177-4179

  Su, Q ^a   Lan, W ^a   Wang, Y Y ^a   Liu, X Q ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Deposition temperature; Raman spectra; Sputtering; Structure; V 2 O 5 films

Indexed keywords

CRYSTAL STRUCTURE; ELECTRON SPECTROSCOPY; MAGNETRON SPUTTERING; RAMAN SCATTERING; REACTIVE SPUTTERING; SPUTTERING; STRUCTURE (COMPOSITION); THERMODYNAMIC STABILITY; VANADIUM PENTOXIDE; X RAY DIFFRACTION;

DC REACTIVE MAGNETRON SPUTTERING; DEPOSITION TEMPERATURES; HIGH DEPOSITION TEMPERATURE; HIGH TEMPERATURE CONDITION; MICRO RAMAN SPECTROSCOPY; REACTIVE MAGNETRON SPUTTERING; REACTIVE SPUTTERING PROCESS; STRUCTURAL CHARACTERIZATION;

FILM PREPARATION;

EID: 58149101298     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.11.002     Document Type: Article

References (17)

1. Singhal A., Skandan G., Amatucci G., Badway F., Ye N., Manthiram A., Manthiram A., Ye H., and Xu J.J. J. Power Sources 129 (2004) 38
2. Oh J.S., Ko J.M., and Kim D.W. Electrochim. Acta 50 (2004) 903
3. Cheng K.C., Chen F.R., and Kai J.J. Solar Energy Mater. Solar Cells 90 (2006) 1156
4. Liu J.F., Wang X., Peng Q., and Li Y.D. Sens. Actuators B 115 (2006) 481
5. Filonenko V.P., Sundberg M., Wernerb P.E., and Zibrov I.P. Acta Cryst. B60 (2004) 375
6. Ganduglia-Pirovano M.V., and Sauer J. Phys. Rev. B 70 (2004) 045422
7. Suzuki T., Saito S., and Arakawa W. J. Non-Cryst. Solids 24 (1977) 355
8. Volkov V.L., Golovkin B.G., Fedyukov A.S., and Zainulin Y.G. Izv. Akad. Nauk SSSR, Neorg. Mater. 24 (1988) 1836
9. Balog P., Orosel D., Cancarevic Z., Schön C., and Jansen M. J. Alloys Compd. 429 (2007) 87
10. Filonenko V.P., and Zibrov I.P. Inorg. Mater. 37 (2001) 953
11. Garcia-Alvarado F., Tarascon J.M., and Wilkens B. J. Electrochem. Soc. 139 (1992) 3206
12. Andrzej G. Chem. Mater. 10 (1998) 2505
13. Fateh N., Fontalvo G.A., and Mitterer C. J. Phys. D: Appl. Phys. 40 (2007) 7716
14. Rajendra Kumar R.T., Karunagaran B., Venkatachalam S., Mangalaraj D., Narayandass S.K., and Kesavamoorthy R. Mater. Lett. 57 (2003) 3820
15. Talledo A., and Valdivia H. J. Vac. Sci. Technol. A 21 4 (2003) 1494
16. Abello L., Husson E., Repelin Y., and Lucazeau G. Spectrochim. Acta 39A 7 (1983) 641
17. Ramana C.V., Smith R.J., Hussian O.M., Massot M., and Julien C.M. Surf. Interface Anal. 37 (2005) 406