Nanoparticles and thin film formation in ultrashort pulsed laser deposition of vanadium oxide

Journal of Physical Chemistry A

Volumn 113, Issue 52, 2009, Pages 14969-14974

  Teghil, Roberto ^a   D'Alessio, Luciano ^a   De Bonis, Angela ^a   Galasso, Agostino ^a   Ibris, Neluta ^a   Salvi, Anna Maria ^a   Santagata, Antonio ^b   Villani, Patrizia ^a,b  

^a UNIVERSITY OF BASILICATA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED FILMS; ICCD IMAGING; LASER-TARGET INTERACTION; MODEL-BASED; NANOMETRIC SIZE; ND:GLASS LASER; PULSE DURATIONS; SECONDARY COMPONENTS; THIN FILM FORMATION; ULTRASHORT LASER PULSE; ULTRASHORT PULSED LASER DEPOSITION; VANADIUM OXIDE THIN FILMS; VANADIUM OXIDES;

AGGLOMERATION; ANGULAR DISTRIBUTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEPOSITION; EMISSION SPECTROSCOPY; GLASS LASERS; NANOPARTICLES; NEODYMIUM LASERS; OPTICAL EMISSION SPECTROSCOPY; OXIDE FILMS; OXIDES; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; THERMAL EVAPORATION; THIN FILMS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 73949111390     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp9050947     Document Type: Article

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