Ion beam sputter deposition of V2O5 thin films

Journal of Power Sources

Volumn 196, Issue 1, 2011, Pages 428-435

  Gallasch, T ^a   Stockhoff, T ^a   Baither, D ^a   Schmitz, G ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

EELS; Ion beam sputter deposition; Li intercalation; TEM; V2O5 thin films; XRD

Indexed keywords

EELS; ION BEAM SPUTTER DEPOSITION; LI INTERCALATION; TEM; V2O5 THIN FILMS; XRD;

ABSORPTION SPECTROSCOPY; BEAM PLASMA INTERACTIONS; DC POWER TRANSMISSION; ENERGY DISSIPATION; ION BEAMS; ION BOMBARDMENT; IONS; OXYGEN; SPUTTER DEPOSITION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 77958053611     PISSN: 03787753     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpowsour.2010.06.099     Document Type: Article

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