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Journal of Materials Chemistry

Volumn 20, Issue 48, 2010, Pages 10841-10846

Effect of manganese doping on Li-ion intercalation properties of V 2O5 films

(8) Yu, D M a,b Zhang, S T a,b Liu, D W a Zhou, X Y a Xie, S H a,c Zhang, Q F a Liu, Y Y a Cao, G Z a

a University of Washington (United States)

b CHONGQING UNIVERSITY (China)

c XIANGTAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC STABILITY; DIP COATING; DISCHARGE CAPACITIES; ELECTROCHEMICAL ANALYSIS; FADING RATE; ION INTERCALATION; LITHIUM IONS; MANGANESE DOPING; MN-DOPED; RATE PERFORMANCE; SOL-GEL PROCESSING; VANADIUM OXIDES;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DOPING (ADDITIVES); ELECTROCHEMICAL PROPERTIES; FILM PREPARATION; IONS; LITHIUM; LITHIUM COMPOUNDS; OXIDE FILMS; SOL-GEL PROCESS; SOLS; VANADIUM; VANADIUM COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

MANGANESE;

EID: 78649708498 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c0jm01252a Document Type: Article

Times cited : (94)

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