First-principles studies on the dominant acceptor and the activation mechanism of phosphorus-doped ZnO

Applied Physics Letters

Volumn 99, Issue 11, 2011, Pages

  Li, Ping ^a   Deng, Sheng Hua ^b   Huang, Jing ^a  

^a ANHUI JIANZHU UNIVERSITY   (China)

^b BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION MECHANISMS; ANNEALING TEMPERATURES; DOPED ZNO; FIRST-PRINCIPLES CALCULATION; FIRST-PRINCIPLES STUDY; OUT-DIFFUSION; P-TYPE; PHOSPHORUS-DOPED; TRANSITION LEVEL; UPPER LIMITS; ZINC INTERSTITIALS; ZNO;

CALCULATIONS; DOPING (ADDITIVES); PHOSPHORUS; ZINC OXIDE;

ZINC;

EID: 80053211752     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3638460     Document Type: Article

References (23)

1. G. Du, Y. Ma, Y. Zhang, and T. Yang, Appl. Phys. Lett. 87, 213103 (2005). 10.1063/1.2132528
2. Y.-Y. Liu, H.-J. Jin, C.-B. Park, and G. C. Hoang, Trans. EEM 10, 24 (2009). 10.4313/TEEM.2009.10.1.024
3. A. Allenic, W. Guo, Y. Chen, M. B. Katz, G. Zhao, Y. Che, Z. Hu, B. Liu, S. B. Zhang, and X. Pan, Adv. Mater. 19, 3333 (2007). 10.1002/adma.200700083
4. A. Allenic, W. Guo, Y. B. Chen, Y. Che, Z. D. Hu, B. Liu, and X. Q. Pan, J. Phys. D: Appl. Phys. 41, 025103 (2008). 10.1088/0022-3727/41/2/025103
5. F. X. Xiu, Z. Yang, L. J. Mandalapu, and J. L. Liu, Appl. Phys. Lett. 88, 052106 (2006). 10.1063/1.2170406
6. F. X. Xiu, Z. Yang, L. J. Mandalapu, and J. L. Liu, Mater. Res. Soc. Symp. Proc. 892, FF18-09 (2006). 10.1557/PROC-0892-FF18-09-EE09-09
7. D.-K. Hwang, H.-S. Kim, J.-H. Lim, and J.-Y. Oh, Appl. Phys. Lett. 86, 151917 (2005). 10.1063/1.1895480
8. Y. R. Ryu, T. S. Lee, and H. W. White, Appl. Phys. Lett. 83, 87 (2003). 10.1063/1.1590423
9. O. Lopatiuk-Tirpak, L. Chernyak, F. X. Xiu, J. L. Liu, S. Jang, F. Ren, S. J. Pearton, K. Gartsman, Y. Feldman, A. Osinsky, and P. Chow, J. Appl. Phys. 100, 086101 (2006). 10.1063/1.2358844
10. O. Lopatiuk-Tirpak, W. V. Schoenfeld, L. Chernyak, F. X. Xiu, J. L. Liu, S. Jang, F. Ren, S. J. Pearton, A. Osinsky, and P. Chow, Appl. Phys. Lett. 88, 202110 (2006). 10.1063/1.2206700
11. S. Limpijumnong, S. B. Zhang, S.-H. Wei, and C. H. Park, Phys. Rev. Lett. 92, 155504 (2004). 10.1103/PhysRevLett.92.155504
12. W.-J. Lee, J. Kang, and K. J. Chang, Phys. Rev. B 73, 024117 (2006). 10.1103/PhysRevB.73.024117
13. P. E. Blchl, Phys. Rev. B 50, 17953 (1994). 10.1103/PhysRevB.50.17953
14. G. Kresse and J. Furthmller, Phys. Rev. B 54, 11169 (1996). 10.1103/PhysRevB.54.11169
15. A. Janotti and C. G. Van de Walle, Rep. Prog. Phys. 72, 126501 (2009). 10.1088/0034-4885/72/12/126501
16. Handbook of Chemistry and Physics, edited by, D. R. Lide, 73rd ed. (CRC, Boca Raton, FL, 1992).
17. C. G. Van de Walle and J. Neugebauer, J. Appl. Phys. 95, 3851 (2004). 10.1063/1.1682673
18. H. Von Wenckstern, G. Benndorf, S. Heitsch, J. Sann, M. Brandt, H. Schmidt, J. Lenzner, M. Lorenz, A. Y. Kuzentsov, B. K. Meyer, and M. Grundmann, Appl. Phys. A 88, 125 (2007). 10.1007/s00339-007-3965-1
19. C. G. Van de Walle and S. Limpijumnong, Phys. Rev. B 63, 245205 (2001). 10.1103/PhysRevB.63.245205
20. K.-K. Kim, H.-S. Kim, D.-K. Hwang, J. H. Lim, and S.-J. Park, App. Phys. Lett. 83, 63 (2003). 10.1063/1.1591064
21. M.-S. Oh, D.-K. Hwang, Y.-S. Choi, J.-W. Kang, S.-J. Park, C.-S. Hwang, and K. I. Cho, Appl. Phys. Lett. 93, 111905 (2008). 10.1063/1.2936962
22. V. Vaithianathan, B.-T. Lee, and S. S. Kim, J. Appl. Phys. 98, 043519 (2005). 10.1063/1.2011775
23. F. X. Xiu, Z. Yang, L. J. Mandalapu, D. T. Zhao, and J. L. Liu, Appl. Phys. Lett. 87, 252102 (2005). 10.1063/1.2146208