Effects of MOCVD thin cobalt films' structure and surface characteristics on their magnetic behavior

Chemical Vapor Deposition

Volumn 17, Issue 7-9, 2011, Pages 211-220

  Papadopoulos, Nikolaos ^a   Karayianni, Chaido Stefania ^a   Tsakiridis, Petros ^a   Sarantopoulou, Evangelia ^b   Hristoforou, Evangelos ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b National Institute of Research   (Greece)

Author keywords

Aerosol Delivery; Cobalt; Magnetization; MOCVD; Precursors; Thin Films

Indexed keywords

AEROSOL DELIVERY; APPLIED MAGNETIC FIELDS; CO FILMS; COBALT ACETYLACETONATE; COBALT CARBONYL; COBALT THIN FILMS; DELIVERY METHODS; EXPERIMENTAL CONDITIONS; MAGNETIC BEHAVIOR; METAL-ORGANIC; PLANARITY; PRECURSORS; SURFACE CHARACTERISTICS; THIN COBALT FILMS;

ATMOSPHERIC AEROSOLS; CARBON DIOXIDE; DICHLOROMETHANE; ELECTRIC RESISTANCE; GIANT MAGNETORESISTANCE; MAGNETIC FIELDS; MAGNETIC PROPERTIES; MAGNETIC RECORDING; MAGNETIZATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; SURFACE MORPHOLOGY; THIN FILMS;

COBALT;

EID: 80053196140     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201106907     Document Type: Article

References (20)

1. J. J. Steele, J. P. Gospodyn, J. C. Sit, M. J. Brett, J. IEEE Sens. 2006, 6, 24.
2. S. V. Kesapragada, P. Victor, O. Nalamasu, D. Gall, Nano Lett. 2006, 6, 854.
3. A. R. Ivanova, G. Nuesca, X. Chen, C. Goldberg, A. E. Kaloyeros, B. Arkles, J. J. Sullivan, J. Electrochem. Soc. 1999, 146, 2139.
4. P. A. Lane, P. E. Oliver, P. J. Wright, C. L. Reeves, A. D. Pitt, B. Cockayne, Chem. Vap. Deposition 1998, 4, 183.
5. R. L. Constock, Introduction to Magnetism and Magnetic Recording, Wiley-Interscience, NY 1999.
6. J. G. Gay, R. Richter, in: Ultrathin Magnetic Structures I (Eds:, J. A. C. Bland, B. Heinrich,) Springer Verlag, Berlin 1994.
7. S. Boukari, J. Venuat, A. Carvalho, J. Arabski, E. Beaurepaire, J. Appl. Phys. 2008, 104, 113907.
8. K. L. Choy, Prog. Mater. Sci. 2003, 48, 57.
9. M. Jergel, I. Cheshko, Y. Halahovets, P. Å iffalovič, I. Mat'ko, R. Senderák, S. Protsenko, E. Majková, Å . Luby, J. Phys. D: Appl. Phys. 2009, 42, 1354.
10. The Chemistry of Metal CVD (Eds:, T. T. Kodas, M. Hampden-Smith,) VCH, Weinheim 1994.
11. M. F. Chioncel, P. W. Haycock, Chem. Vap. Deposition 2005, 11, 235.
12. N. Deo, M. F. Bain, J. H. Montgomery, H. S. Gamble, J. Mater. Sci.: Mater. Electron. 2005, 16, 387.
13. S. Pasko, A. Abrutis, L. G. Hubert-Pfalzgraf, V. Kubilius, J. Cryst. Growth 2004, 262, 653.
14. L. M. Apatiga, V. M. Castano, Thin Solid Films 2006, 496, 576.
15. J. Lee, H. J. Yang, J. H. Lee, J. Y. Kim, W. J. Nam, H. J. Shin, Y. K. Ko, J. G. Lee, E. G. Lee, C. S. Kim, J. Electrochem. Soc. 2006, 153, G539.
16. P. A. Premkumar, N. Bahlawane, G. Reiss, K. Kohse-Höinghaus, Chem. Vap. Deposition 2007, 13, 227.
17. J. C. Lötters, Bronkhorst High-Tech BV, Gases & Technology 2005, Sept/Oct.
18. R. Fermento, D. C. Leitao, J. M. Teixeira, A. M. Pereira, F. Carpinteiro, J. Ventura, J. P. Araujo, J. B. Sousa, J. Non-Cryst. Solids 2008, 354, 5279.
19. D. L. Smith, Thin-Film Deposition, Principles and Practice, McGraw-Hill, NY 1995.
20. C. P. A. Mulchay, A. J. Carman, S. M. Casey, Surf. Sci. 2000, 459, 1.