Structural, magnetic and transport properties of ion beam deposited Co thin films

Journal of Non-Crystalline Solids

Volumn 354, Issue 47-51, 2008, Pages 5279-5281

  Fermento, R ^a   Leitao, D C ^a   Teixeira, J M ^a   Pereira, A M ^a   Carpinteiro, F ^a   Ventura, J ^a   Araujo, J P ^a   Sousa, J B ^a  

^a UNIVERSITY OF PORTO   (Portugal)

Author keywords

Conductivity; Crystal growth; Magnetic properties; Sensors; Sputtering; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; BEAM PLASMA INTERACTIONS; BUFFER LAYERS; COBALT; COPPER; CRYSTAL GROWTH; DIFFRACTION; ELECTRIC RESISTANCE; ELECTROMAGNETIC WAVES; EPITAXIAL LAYERS; GRAIN BOUNDARIES; ION BEAMS; ION BOMBARDMENT; KERR MAGNETOOPTICAL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETISM; MAGNETOOPTICAL EFFECTS; MAGNETORESISTANCE; OPTICAL KERR EFFECT; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; PROBABILITY DENSITY FUNCTION; SOLIDS; SPUTTERING; TANTALUM; THICK FILMS; THIN FILMS; TRANSPORT PROPERTIES; X RAY ANALYSIS; X RAY DIFFRACTION;

ANISOTROPIC MAGNETORESISTANCES; APPLICATIONS.; BUFFER LAYER MATERIALS; CO FILMS; CO THIN FILMS; CONDUCTIVITY; ELECTRICAL RESISTIVITIES; ION BEAM SPUTTERING; MAGNETIC AND TRANSPORT PROPERTIES; MAGNETIC NANOSTRUCTURES; X-RAY DIFFRACTIONS;

MAGNETIC THIN FILMS;

EID: 55349115684     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.05.077     Document Type: Article

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