Study of magnetic properties of thin cobalt films deposited by chemical vapour deposition

Journal of Materials Science: Materials in Electronics

Volumn 16, Issue 7, 2005, Pages 387-392

  Deo, N ^a   Bain, M F ^a   Montgomery, J H ^a   Gamble, H S ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COBALT; COBALT COMPOUNDS; MAGNETIC PROPERTIES; MAGNETIZATION; MAGNETOMETERS; OXIDATION; SILICON WAFERS; SURFACE STRUCTURE; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

COBALT TRICARBONYL NITROSYL; LIQUID SOURCE PRECURSOR; MAGNETIC FORCE MICROSCOPY; PRECURSOR FLOW RATES; THIN COBALT FILMS; VIBRATING SAMPLE MAGNETOMETER (VSM) YIELDS;

MAGNETIC THIN FILMS;

EID: 24944590312     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10854-005-2302-8     Document Type: Article

References (5)

1. M.N. Baibich, J.M. Broto, A. Fert, F. Nguyen Van Dau, F. Petroff, P. Eitenne, G. Creuzet, A. Friederich and J. Chazelas, Phys. Rev. Lett. 61 (1988) 2472. 10.1103/PhysRevLett.61.2472
2. N. Deo, M. Bain, J. Montgomery and H. S. Gamble, in Symposium V1, "CVD XVI and EURO-CVD 14," as a Part of the 203rd Meeting of The Electrochemical Society in Paris, France from April 27-May 2, 2003, p. 1008.
3. D. Jiles, "Introduction to Magnetism and Magnetic Materials" 2nd ed., 1998.
4. J. Yin, B. Shen, D. Wang, X. Yin, M. Wang and Y. Du, J. Alloys Comp. 316 (2001) 296. 10.1016/S0925-8388(00)01497-3
5. P. Mingxiang, W. Bingchen, X. Lei, W. Weihua, Z. Deqian, Z. Zhi and H. B. Shan, Intermetallics 10 (2002) 1215. 10.1016/S0966-9795(02)00147-4