-
1
-
-
0030206894
-
Novel oxide amorphous semiconductors: Transparent conducting amorphous oxides
-
Aug
-
H. Hosono, M. Yasukawa, and H. Kawazoe, "Novel oxide amorphous semiconductors: Transparent conducting amorphous oxides," J. Non-Cryst. Solids, vol. 203, pp. 334-344, Aug. 1996.
-
(1996)
J. Non-Cryst. Solids
, vol.203
, pp. 334-344
-
-
Hosono, H.1
Yasukawa, M.2
Kawazoe, H.3
-
2
-
-
54249125012
-
Zn-In-O based thin-film transistors: Compositional dependence
-
Aug
-
N. Itagaki, T. Iwasaki, H. Kumomi, T. Den, K. Nomura, T. Kamiya, and H. Hosono, "Zn-In-O based thin-film transistors: Compositional dependence," Phys. Stat. Sol. (A), vol. 205, no. 8, pp. 1915-1919, Aug. 2008.
-
(2008)
Phys. Stat. Sol. (A)
, vol.205
, Issue.8
, pp. 1915-1919
-
-
Itagaki, N.1
Iwasaki, T.2
Kumomi, H.3
Den, T.4
Nomura, K.5
Kamiya, T.6
Hosono, H.7
-
3
-
-
13544269370
-
High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer
-
Jan
-
H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, "High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer," Appl. Phys. Lett., vol. 86, no. 1, p. 013 503, Jan. 2005.
-
(2005)
Appl. Phys. Lett.
, vol.86
, Issue.1
, pp. 013503
-
-
Chiang, H.Q.1
Wager, J.F.2
Hoffman, R.L.3
Jeong, J.4
Keszler, D.A.5
-
5
-
-
33745435681
-
Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application
-
Jun
-
H. Hosono, "Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application," J. Non-Cryst. Solids, vol. 352, no. 9-20, pp. 851-858, Jun. 2006.
-
(2006)
J. Non-Cryst. Solids
, vol.352
, Issue.9-20
, pp. 851-858
-
-
Hosono, H.1
-
6
-
-
0037708293
-
High mobility thin film transistors with transparent ZnO channels
-
Apr
-
J. Nishii, F. M. Hossain, S. Takagi, and T. Aita, "High mobility thin film transistors with transparent ZnO channels," Jpn. J. Appl. Phys., vol. 42, no. 4A, pp. L347-L349, Apr. 2003.
-
(2003)
Jpn. J. Appl. Phys.
, vol.42
, Issue.4 A
-
-
Nishii, J.1
Hossain, F.M.2
Takagi, S.3
Aita, T.4
-
7
-
-
52949097961
-
Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors
-
Sep
-
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, "Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors," Appl. Phys. Lett., vol. 93, no. 12, p. 123 508, Sep. 2008.
-
(2008)
Appl. Phys. Lett.
, vol.93
, Issue.12
, pp. 123508
-
-
Jeong, J.K.1
Yang, H.W.2
Jeong, J.H.3
Mo, Y.G.4
Kim, H.D.5
-
8
-
-
77951531173
-
High stability of amorphous hafniumindium-zinc-oxide thin film transistor
-
Apr. 2010
-
E. Chong, K. C. Jo, and S. Y. Lee, "High stability of amorphous hafniumindium-zinc-oxide thin film transistor," Appl. Phys. Lett., vol. 96, no. 15, p. 152102, Apr. 2010.
-
Appl. Phys. Lett.
, vol.96
, Issue.15
, pp. 152102
-
-
Chong, E.1
Jo, K.C.2
Lee, S.Y.3
-
9
-
-
34547365696
-
Improvements in the device characteristics of amorphous indium gallium zinc oxide thinfilm transistors by Ar plasma treatment
-
Jun
-
J. S. Park, J. K. Jeong, Y. G. Mo, H. D. Kim, and S. I. Kim, "Improvements in the device characteristics of amorphous indium gallium zinc oxide thinfilm transistors by Ar plasma treatment," Appl. Phys. Lett., vol. 90, no. 26, p. 262 106, Jun. 2007.
-
(2007)
Appl. Phys. Lett.
, vol.90
, Issue.26
, pp. 262106
-
-
Park, J.S.1
Jeong, J.K.2
Mo, Y.G.3
Kim, H.D.4
Kim, S.I.5
-
10
-
-
28044449759
-
Electrical and optical properties of amorphous indium zinc oxide films
-
Feb
-
N. Ito, Y. Sato, P. K. Song, A. Kaijio, and K. Inoue, "Electrical and optical properties of amorphous indium zinc oxide films," Thin Solid Films, vol. 496, no. 1, pp. 99-103, Feb. 2006.
-
(2006)
Thin Solid Films
, vol.496
, Issue.1
, pp. 99-103
-
-
Ito, N.1
Sato, Y.2
Song, P.K.3
Kaijio, A.4
Inoue, K.5
-
11
-
-
0242366728
-
Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film
-
Nov
-
Y. S. Jung, J. Y. Seo, D. W. Lee, and D. Y. Jeon, "Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film," Thin Solid Films, vol. 445, no. 1, pp. 63-71, Nov. 2003.
-
(2003)
Thin Solid Films
, vol.445
, Issue.1
, pp. 63-71
-
-
Jung, Y.S.1
Seo, J.Y.2
Lee, D.W.3
Jeon, D.Y.4
-
12
-
-
0035824090
-
Resistivity of polycrystalline zinc oxide films: Current status and physical limit
-
Nov
-
K. Ellmer, "Resistivity of polycrystalline zinc oxide films: Current status and physical limit," J. Phys. D, Appl. Phys., vol. 34, no. 21, pp. 3097-3108, Nov. 2001.
-
(2001)
J. Phys. D, Appl. Phys.
, vol.34
, Issue.21
, pp. 3097-3108
-
-
Ellmer, K.1
-
13
-
-
42649117785
-
Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors
-
May
-
H. Q. Chiang, B. R. McFarlane, D. Hong, R. E. Presley, and J. F. Wager, "Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors," J. Non-Cryst. Solids, vol. 354, no. 19-25, pp. 2826-2830, May 2008.
-
(2008)
J. Non-Cryst. Solids
, vol.354
, Issue.19-25
, pp. 2826-2830
-
-
Chiang, H.Q.1
McFarlane, B.R.2
Hong, D.3
Presley, R.E.4
Wager, J.F.5
-
15
-
-
43049106497
-
High-performance indium gallium zinc oxide transparent thin-film transistors fabricated by radio-frequency sputtering
-
W. Lim, S. H. Kim, Y. L. Wang, J. W. Lee, D. P. Norton, S. J. Pearton, F. Ren, and I. I. Kravchenko, "High-performance indium gallium zinc oxide transparent thin-film transistors fabricated by radio-frequency sputtering," J. Electrochem. Soc., vol. 155, no. 6, pp. H383-H385, 2008.
-
(2008)
J. Electrochem. Soc.
, vol.155
, Issue.6
-
-
Lim, W.1
Kim, S.H.2
Wang, Y.L.3
Lee, J.W.4
Norton, D.P.5
Pearton, S.J.6
Ren, F.7
Kravchenko, I.I.8
-
16
-
-
57049142035
-
Bottom-gate gallium indium zinc oxide thin-film transistor array for high-resolution AMOLED display
-
Dec
-
J. Y. Kwon, K. S. Son, J. S. Jung, T. S. Kim, M. K. Ryu, K. B. Park, and B. W. Yo, "Bottom-gate gallium indium zinc oxide thin-film transistor array for high-resolution AMOLED display," IEEE Electron Device Lett., vol. 29, no. 12, pp. 1309-1311, Dec. 2008.
-
(2008)
IEEE Electron Device Lett.
, vol.29
, Issue.12
, pp. 1309-1311
-
-
Kwon, J.Y.1
Son, K.S.2
Jung, J.S.3
Kim, T.S.4
Ryu, M.K.5
Park, K.B.6
Yo, B.W.7
-
17
-
-
79955521527
-
Stability of IZO and a-Si:H TFTs processed at low temperature (200 °C)
-
K. Kaftanoglu, S. M. Venugopal, M. A. Marrs, A. Dey, E. J. Bawolek, D. R. Allee, and D. Loy, "Stability of IZO and a-Si:H TFTs processed at low temperature (200 °C)," J. Display Technol., 2011.
-
(2011)
J. Display Technol
-
-
Kaftanoglu, K.1
Venugopal, S.M.2
Marrs, M.A.3
Dey, A.4
Bawolek, E.J.5
Allee, D.R.6
Loy, D.7
-
18
-
-
78751565475
-
Temporary bond-debond process for manufacture of flexible electronics: Impact of adhesive and carrier properties on performance
-
Dec
-
J. Haq, S. Ageno, S. O'Rourke, G. B. Raupp, B. D. Vogt, and D. Loy, "Temporary bond-debond process for manufacture of flexible electronics: Impact of adhesive and carrier properties on performance," J. Appl. Phys., vol. 108, no. 11, p. 114 917, Dec. 2010.
-
(2010)
J. Appl. Phys.
, vol.108
, Issue.11
, pp. 114917
-
-
Haq, J.1
Ageno, S.2
O'Rourke, S.3
Raupp, G.B.4
Vogt, B.D.5
Loy, D.6
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