메뉴 건너뛰기




Volumn 58, Issue 10, 2011, Pages 3428-3434

Control of threshold voltage and saturation mobility using dual-active-layer device based on amorphous mixed metal-oxide-semiconductor on flexible plastic substrates

Author keywords

Flexible electronics; indium gallium zinc oxide (IGZO) thin film transistor (TFT); organic light emitting diode (OLED); polyethylene naphthalate (PEN)

Indexed keywords

ACTIVE LAYER; AMORPHOUS OXIDE SEMICONDUCTORS; DEVICE FABRICATIONS; DEVICE PERFORMANCE; FLEXIBLE PLASTIC SUBSTRATES; FLEXIBLE SUBSTRATE; HIGH-TEMPERATURE ANNEALING; INDIUM GALLIUM ZINC OXIDES; METAL OXIDE SEMICONDUCTOR; MIXED METAL OXIDE; NOVEL DEVICE ARCHITECTURES; POLYETHYLENE NAPHTHALATE; POLYETHYLENE NAPHTHALATE (PEN); PROCESSING TEMPERATURE; SATURATION MOBILITY; STABILITY ISSUES; THRESHOLD VOLTAGE SHIFTS; ZINC INDIUM OXIDE;

EID: 80053176407     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2011.2161764     Document Type: Article
Times cited : (52)

References (19)
  • 1
    • 0030206894 scopus 로고    scopus 로고
    • Novel oxide amorphous semiconductors: Transparent conducting amorphous oxides
    • Aug
    • H. Hosono, M. Yasukawa, and H. Kawazoe, "Novel oxide amorphous semiconductors: Transparent conducting amorphous oxides," J. Non-Cryst. Solids, vol. 203, pp. 334-344, Aug. 1996.
    • (1996) J. Non-Cryst. Solids , vol.203 , pp. 334-344
    • Hosono, H.1    Yasukawa, M.2    Kawazoe, H.3
  • 3
    • 13544269370 scopus 로고    scopus 로고
    • High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer
    • Jan
    • H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, "High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer," Appl. Phys. Lett., vol. 86, no. 1, p. 013 503, Jan. 2005.
    • (2005) Appl. Phys. Lett. , vol.86 , Issue.1 , pp. 013503
    • Chiang, H.Q.1    Wager, J.F.2    Hoffman, R.L.3    Jeong, J.4    Keszler, D.A.5
  • 5
    • 33745435681 scopus 로고    scopus 로고
    • Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application
    • Jun
    • H. Hosono, "Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application," J. Non-Cryst. Solids, vol. 352, no. 9-20, pp. 851-858, Jun. 2006.
    • (2006) J. Non-Cryst. Solids , vol.352 , Issue.9-20 , pp. 851-858
    • Hosono, H.1
  • 6
    • 0037708293 scopus 로고    scopus 로고
    • High mobility thin film transistors with transparent ZnO channels
    • Apr
    • J. Nishii, F. M. Hossain, S. Takagi, and T. Aita, "High mobility thin film transistors with transparent ZnO channels," Jpn. J. Appl. Phys., vol. 42, no. 4A, pp. L347-L349, Apr. 2003.
    • (2003) Jpn. J. Appl. Phys. , vol.42 , Issue.4 A
    • Nishii, J.1    Hossain, F.M.2    Takagi, S.3    Aita, T.4
  • 7
    • 52949097961 scopus 로고    scopus 로고
    • Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors
    • Sep
    • J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, "Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors," Appl. Phys. Lett., vol. 93, no. 12, p. 123 508, Sep. 2008.
    • (2008) Appl. Phys. Lett. , vol.93 , Issue.12 , pp. 123508
    • Jeong, J.K.1    Yang, H.W.2    Jeong, J.H.3    Mo, Y.G.4    Kim, H.D.5
  • 8
    • 77951531173 scopus 로고    scopus 로고
    • High stability of amorphous hafniumindium-zinc-oxide thin film transistor
    • Apr. 2010
    • E. Chong, K. C. Jo, and S. Y. Lee, "High stability of amorphous hafniumindium-zinc-oxide thin film transistor," Appl. Phys. Lett., vol. 96, no. 15, p. 152102, Apr. 2010.
    • Appl. Phys. Lett. , vol.96 , Issue.15 , pp. 152102
    • Chong, E.1    Jo, K.C.2    Lee, S.Y.3
  • 9
    • 34547365696 scopus 로고    scopus 로고
    • Improvements in the device characteristics of amorphous indium gallium zinc oxide thinfilm transistors by Ar plasma treatment
    • Jun
    • J. S. Park, J. K. Jeong, Y. G. Mo, H. D. Kim, and S. I. Kim, "Improvements in the device characteristics of amorphous indium gallium zinc oxide thinfilm transistors by Ar plasma treatment," Appl. Phys. Lett., vol. 90, no. 26, p. 262 106, Jun. 2007.
    • (2007) Appl. Phys. Lett. , vol.90 , Issue.26 , pp. 262106
    • Park, J.S.1    Jeong, J.K.2    Mo, Y.G.3    Kim, H.D.4    Kim, S.I.5
  • 10
    • 28044449759 scopus 로고    scopus 로고
    • Electrical and optical properties of amorphous indium zinc oxide films
    • Feb
    • N. Ito, Y. Sato, P. K. Song, A. Kaijio, and K. Inoue, "Electrical and optical properties of amorphous indium zinc oxide films," Thin Solid Films, vol. 496, no. 1, pp. 99-103, Feb. 2006.
    • (2006) Thin Solid Films , vol.496 , Issue.1 , pp. 99-103
    • Ito, N.1    Sato, Y.2    Song, P.K.3    Kaijio, A.4    Inoue, K.5
  • 11
    • 0242366728 scopus 로고    scopus 로고
    • Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film
    • Nov
    • Y. S. Jung, J. Y. Seo, D. W. Lee, and D. Y. Jeon, "Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film," Thin Solid Films, vol. 445, no. 1, pp. 63-71, Nov. 2003.
    • (2003) Thin Solid Films , vol.445 , Issue.1 , pp. 63-71
    • Jung, Y.S.1    Seo, J.Y.2    Lee, D.W.3    Jeon, D.Y.4
  • 12
    • 0035824090 scopus 로고    scopus 로고
    • Resistivity of polycrystalline zinc oxide films: Current status and physical limit
    • Nov
    • K. Ellmer, "Resistivity of polycrystalline zinc oxide films: Current status and physical limit," J. Phys. D, Appl. Phys., vol. 34, no. 21, pp. 3097-3108, Nov. 2001.
    • (2001) J. Phys. D, Appl. Phys. , vol.34 , Issue.21 , pp. 3097-3108
    • Ellmer, K.1
  • 13
    • 42649117785 scopus 로고    scopus 로고
    • Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors
    • May
    • H. Q. Chiang, B. R. McFarlane, D. Hong, R. E. Presley, and J. F. Wager, "Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors," J. Non-Cryst. Solids, vol. 354, no. 19-25, pp. 2826-2830, May 2008.
    • (2008) J. Non-Cryst. Solids , vol.354 , Issue.19-25 , pp. 2826-2830
    • Chiang, H.Q.1    McFarlane, B.R.2    Hong, D.3    Presley, R.E.4    Wager, J.F.5
  • 15
    • 43049106497 scopus 로고    scopus 로고
    • High-performance indium gallium zinc oxide transparent thin-film transistors fabricated by radio-frequency sputtering
    • W. Lim, S. H. Kim, Y. L. Wang, J. W. Lee, D. P. Norton, S. J. Pearton, F. Ren, and I. I. Kravchenko, "High-performance indium gallium zinc oxide transparent thin-film transistors fabricated by radio-frequency sputtering," J. Electrochem. Soc., vol. 155, no. 6, pp. H383-H385, 2008.
    • (2008) J. Electrochem. Soc. , vol.155 , Issue.6
    • Lim, W.1    Kim, S.H.2    Wang, Y.L.3    Lee, J.W.4    Norton, D.P.5    Pearton, S.J.6    Ren, F.7    Kravchenko, I.I.8
  • 16
    • 57049142035 scopus 로고    scopus 로고
    • Bottom-gate gallium indium zinc oxide thin-film transistor array for high-resolution AMOLED display
    • Dec
    • J. Y. Kwon, K. S. Son, J. S. Jung, T. S. Kim, M. K. Ryu, K. B. Park, and B. W. Yo, "Bottom-gate gallium indium zinc oxide thin-film transistor array for high-resolution AMOLED display," IEEE Electron Device Lett., vol. 29, no. 12, pp. 1309-1311, Dec. 2008.
    • (2008) IEEE Electron Device Lett. , vol.29 , Issue.12 , pp. 1309-1311
    • Kwon, J.Y.1    Son, K.S.2    Jung, J.S.3    Kim, T.S.4    Ryu, M.K.5    Park, K.B.6    Yo, B.W.7
  • 18
    • 78751565475 scopus 로고    scopus 로고
    • Temporary bond-debond process for manufacture of flexible electronics: Impact of adhesive and carrier properties on performance
    • Dec
    • J. Haq, S. Ageno, S. O'Rourke, G. B. Raupp, B. D. Vogt, and D. Loy, "Temporary bond-debond process for manufacture of flexible electronics: Impact of adhesive and carrier properties on performance," J. Appl. Phys., vol. 108, no. 11, p. 114 917, Dec. 2010.
    • (2010) J. Appl. Phys. , vol.108 , Issue.11 , pp. 114917
    • Haq, J.1    Ageno, S.2    O'Rourke, S.3    Raupp, G.B.4    Vogt, B.D.5    Loy, D.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.