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Volumn 50, Issue 9 PART 3, 2011, Pages

Effect of stress engineering on the electrical properties of BaTiO 3 thin film

(7) Fukamachi, Kohei a Sakamoto, Naonori a Ohno, Tomoya b Fu, Desheng a Wakiya, Naoki a Matsuda, Takeshi b Suzuki, Hisao a

a SHIZUOKA UNIVERSITY (Japan)

b KITAMI INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SOLUTION DEPOSITION; EFFECT OF STRESS; FERROELECTRIC PROPERTY; LNO THIN FILMS; LOW TEMPERATURES; NANO-POROUS; OXIDE ELECTRODES; PREFERRED ORIENTATIONS; RF-MAGNETRON SPUTTERING; SI SUBSTRATES; THIN-FILM ELECTRODE;

BARIUM COMPOUNDS; ELECTRIC PROPERTIES; ELECTRODES; FERROELECTRIC FILMS; FERROELECTRICITY; MAGNETRON SPUTTERING; SUBSTRATES; THIN FILMS;

VAPOR DEPOSITION;

EID: 80053061468 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.09NA03 Document Type: Article

Times cited : (11)

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