Effect of the electrode structure on the electrical properties of alkoxide derived ferroelectric thin film

Materials Letters

Volumn 64, Issue 15, 2010, Pages 1742-1744

  Ohno, Tomoya ^a   Matsuda, Takeshi ^a   Nukina, Takero ^b   Sakamoto, Naonori ^b   Wakiya, Naoki ^b   Shou, Tokuda ^a   Suzuki, Hisao ^b  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Chemical solution deposition; Ferroelectrics; Stress engineering; Thin films

Indexed keywords

CHEMICALS; COBALT COMPOUNDS; CRYSTAL ORIENTATION; DEPOSITION; ELECTRODES; FERROELECTRIC CERAMICS; FERROELECTRIC MATERIALS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; FILM PREPARATION; LANTHANUM; LANTHANUM OXIDES; LEAD; SEMICONDUCTING LEAD COMPOUNDS; SILICON WAFERS; THERMAL EXPANSION;

CHEMICAL SOLUTION DEPOSITION; CRYSTAL ORIENTATION CONTROL; DIELECTRIC AND FERROELECTRIC PROPERTIES; LANTHANUM STRONTIUM COBALT OXIDE; LEAD ZIRCONATE TITANATE; MORPHOTROPIC PHASE BOUNDARIES; STRESS ENGINEERING; THERMAL EXPANSION COEFFICIENTS;

THIN FILMS;

EID: 80053069182     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.04.028     Document Type: Article

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