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Volumn 111, Issue 7, 2011, Pages 865-876

Atomic imaging using secondary electrons in a scanning transmission electron microscope: Experimental observations and possible mechanisms

Author keywords

Aberration correction; High resolution electron microscopy; Secondary electron imaging

Indexed keywords

ABERRATION CORRECTION; APPLIED BIAS; ATOMIC IMAGING; ATOMIC NUMBERS; ATOMIC SCALE; CRYSTAL SURFACES; DARK-FIELD; EXPERIMENTAL OBSERVATION; HIGH RESOLUTION; HIGH-RESOLUTION IMAGING; HITACHI; IMAGE INTENSITIES; MATERIALS CHARACTERIZATION; SCANNING TRANSMISSION ELECTRON MICROSCOPES; SECONDARY ELECTRONS; TRANSMISSION ELECTRON MICROSCOPE; ULTRAHIGH RESOLUTION;

EID: 80053052168     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.10.002     Document Type: Article
Times cited : (50)

References (36)
  • 15
    • 80053053724 scopus 로고
    • Monte Carlo Modeling for Electron Microscopy and Microanalysis, Oxford University Press, New York.
    • D.C. Joy, Monte Carlo Modeling for Electron Microscopy and Microanalysis, Oxford University Press, New York, 1995).
    • (1995)
    • Joy, D.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.