-
1
-
-
67949097936
-
-
H. Y. Lee, P. S. Chen, T. Y. Wu, Y. S. Chen, C. C. Wang, P. J. Tzeng, C. H. Lin, F. Chen, C. H. Lien, and M.-J. Tsai, IEDM Tech. Dig. (2008) p. 1-4. http://ieeexplore.ieee.org/xpls/abs-all.jsp?arnumber=4796677&tag=1
-
(2008)
IEDM Tech. Dig.
, pp. 1-4
-
-
Lee, H.Y.1
Chen, P.S.2
Wu, T.Y.3
Chen, Y.S.4
Wang, C.C.5
Tzeng, P.J.6
Lin, C.H.7
Chen, F.8
Lien, C.H.9
Tsai, M.-J.10
-
2
-
-
22144448904
-
2 thin films
-
DOI 10.1063/1.1968416, 262907
-
C. Rohde, B. J. Choi, D. S. Jeong, S. Choi, J.-S. Zhao, and C. S. Hwang, Appl. Phys. Lett. 86, 262907 (2005). 10.1063/1.1968416 (Pubitemid 40983220)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.26
, pp. 1-3
-
-
Rohde, C.1
Choi, B.J.2
Jeong, D.S.3
Choi, S.4
Zhao, J.-S.5
Hwang, C.S.6
-
3
-
-
76449090212
-
-
10.1063/1.3294632
-
L. W. Feng, C. Y. Chang, Y. F. Chang, W. R. Chen, S. Y. Wang, P. W. Chiang, and T. C. Chang, Appl. Phys. Lett. 96, 052111 (2010). 10.1063/1.3294632
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 052111
-
-
Feng, L.W.1
Chang, C.Y.2
Chang, Y.F.3
Chen, W.R.4
Wang, S.Y.5
Chiang, P.W.6
Chang, T.C.7
-
4
-
-
77951151750
-
-
10.1149/1.3360181
-
M. C. Chen, T. C. Chang, S. Y. Huang, S. C. Chen, C. W. Hu, C. T. Tsai, and S. M. Sze, Electrochem. Solid-State Lett. 13 (6), H191 (2010). 10.1149/1.3360181
-
(2010)
Electrochem. Solid-State Lett.
, vol.13
, Issue.6
, pp. 191
-
-
Chen, M.C.1
Chang, T.C.2
Huang, S.Y.3
Chen, S.C.4
Hu, C.W.5
Tsai, C.T.6
Sze, S.M.7
-
5
-
-
70350732732
-
-
10.1149/1.3240201
-
K. M. Kim, B. J. Choi, S. J. Song, G. H. Kim, and C. S. Hwang, J. Electrochem. Soc. 156, G213 (2009). 10.1149/1.3240201
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 213
-
-
Kim, K.M.1
Choi, B.J.2
Song, S.J.3
Kim, G.H.4
Hwang, C.S.5
-
6
-
-
77956198128
-
-
10.1063/1.3483158
-
C. Chen, Y. C. Yang, F. Zeng, and F. Pan, Appl. Phys. Lett. 97, 083502 (2010). 10.1063/1.3483158
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 083502
-
-
Chen, C.1
Yang, Y.C.2
Zeng, F.3
Pan, F.4
-
7
-
-
33745038459
-
Interface resistance switching at a few nanometer thick perovskite manganite active layers
-
DOI 10.1063/1.2211147
-
A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. 88, 232112 (2006). 10.1063/1.2211147 (Pubitemid 43877735)
-
(2006)
Applied Physics Letters
, vol.88
, Issue.23
, pp. 232112
-
-
Sawa, A.1
Fujii, T.2
Kawasaki, M.3
Tokura, Y.4
-
8
-
-
57049176592
-
-
10.1143/APEX.1.055002
-
K. Shono, H. Kawano, T. Yokota, and M. Gomi, Appl. Phys. Express 1, 055002 (2008). 10.1143/APEX.1.055002
-
(2008)
Appl. Phys. Express
, vol.1
, pp. 055002
-
-
Shono, K.1
Kawano, H.2
Yokota, T.3
Gomi, M.4
-
9
-
-
57649099988
-
-
10.1143/APEX.1.101901
-
H. Kawano, K. Shono, T. Yokota, and M. Gomi, Appl. Phys. Express 1, 101901 (2008). 10.1143/APEX.1.101901
-
(2008)
Appl. Phys. Express
, vol.1
, pp. 101901
-
-
Kawano, H.1
Shono, K.2
Yokota, T.3
Gomi, M.4
-
10
-
-
33846006567
-
Multiferroics: A magnetic twist for ferroelectricity
-
DOI 10.1038/nmat1804, PII NMAT1804
-
S.-W. Cheong and M. Mostovoy, Nature Mater. 6, 13 (2007). 10.1038/nmat1804 (Pubitemid 46043268)
-
(2007)
Nature Materials
, vol.6
, Issue.1
, pp. 13-20
-
-
Cheong, S.-W.1
Mostovoy, M.2
-
11
-
-
33646747657
-
-
10.1063/1.2165586
-
C. R. dela Cruz, F. Yen, B. Lorenz, S. Park, S.-W. Cheong, M. M. Gospodinov, W. Ratcliff, J. W. Lynn, and C. W. Chu, J. Appl. Phys. 99, 08R103 (2006). 10.1063/1.2165586
-
(2006)
J. Appl. Phys.
, vol.99
-
-
Dela Cruz, C.R.1
Yen, F.2
Lorenz, B.3
Park, S.4
Cheong, S.-W.5
Gospodinov, M.M.6
Ratcliff, W.7
Lynn, J.W.8
Chu, C.W.9
-
12
-
-
34447646772
-
-
10.1103/PhysRevB.76.012406
-
Y. Jo, K.-H. Jang, J.-G. Park, H. C. Kim, T. H. Kim, K. H. Kim, N. Hur, S. Park, and S.-W. Cheong, Phys. Rev. B 76, 012406 (2007). 10.1103/PhysRevB.76. 012406
-
(2007)
Phys. Rev. B
, vol.76
, pp. 012406
-
-
Jo, Y.1
Jang, K.-H.2
Park, J.-G.3
Kim, H.C.4
Kim, T.H.5
Kim, K.H.6
Hur, N.7
Park, S.8
Cheong, S.-W.9
-
15
-
-
78951482667
-
-
10.1149/1.3531843
-
Y. T. Tsai, T. C. Chang, C. C. Lin, S. C. Chen, C. W. Chen, S. M. Sze, F. S. Huang, and T. Y. Tseng, Electrochem. Solid-State Lett. 14 (3), H135 (2011). 10.1149/1.3531843
-
(2011)
Electrochem. Solid-State Lett.
, vol.14
, Issue.3
, pp. 135
-
-
Tsai, Y.T.1
Chang, T.C.2
Lin, C.C.3
Chen, S.C.4
Chen, C.W.5
Sze, S.M.6
Huang, F.S.7
Tseng, T.Y.8
-
16
-
-
68249119187
-
-
10.1063/1.3191674
-
M. K. Yang, J. W. Park, T. K. Ko, and J. K. Lee, Appl. Phys. Lett. 95, 042105 (2009). 10.1063/1.3191674
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 042105
-
-
Yang, M.K.1
Park, J.W.2
Ko, T.K.3
Lee, J.K.4
-
17
-
-
77953594299
-
-
10.1063/1.3442499
-
J. S. Kwak, Y. H. Do, Y. C. Bae, H. S. Im, J. H. Yoo, M. G. Sung, Y. T. Hwang, and J. P. Hong, Appl. Phys. Lett. 96, 223502 (2010). 10.1063/1.3442499
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 223502
-
-
Kwak, J.S.1
Do, Y.H.2
Bae, Y.C.3
Im, H.S.4
Yoo, J.H.5
Sung, M.G.6
Hwang, Y.T.7
Hong, J.P.8
-
18
-
-
80052538800
-
-
IEDM Tech. Dig., 1-4
-
B. Gao, S. Yu, N. Xu, L. F. Liu, B. Sun, X. Y. Liu, R. Q. Han, J. F. Kang, B. Yu, and Y. Y. Wang, IEDM Tech. Dig., (2008) p. 1-4.
-
(2008)
-
-
Gao, B.1
Yu, S.2
Xu, N.3
Liu, L.F.4
Sun, B.5
Liu, X.Y.6
Han, R.Q.7
Kang, J.F.8
Yu, B.9
Wang, Y.Y.10
-
19
-
-
77957905759
-
-
X. P. Wang, Y. Y. Chen, L. Pantisano, L. Goux, M. Jurczak, G. Groeseneken, and D. J. Wouters, in IEEE international Symposium on VLSI Technology, (2010) p. 140-141.
-
(2010)
IEEE International Symposium on VLSI Technology
, pp. 140-141
-
-
Wang, X.P.1
Chen, Y.Y.2
Pantisano, L.3
Goux, L.4
Jurczak, M.5
Groeseneken, G.6
Wouters, D.J.7
-
20
-
-
78149457942
-
-
10.1063/1.3491803
-
J. Lee, E. M. Bourim, W. Lee, J. Park, M. Jo, S. Jung, J. Shin, and H. Hwang, Appl. Phys. Lett. 97, 172105 (2010). 10.1063/1.3491803
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 172105
-
-
Lee, J.1
Bourim, E.M.2
Lee, W.3
Park, J.4
Jo, M.5
Jung, S.6
Shin, J.7
Hwang, H.8
|