Identification of a determining parameter for resistive switching of TiO2 thin films

Applied Physics Letters

Volumn 86, Issue 26, 2005, Pages 1-3

  Rohde, Christina ^a,b   Choi, Byung Joon ^a   Jeong, Doo Seok ^a   Choi, Seol ^a   Zhao, Jin Shi ^a   Hwang, Cheol Seong ^a  

^a Seoul National University   (South Korea)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NONVOLATILE STORAGE; SWITCHING; TITANIUM DIOXIDE; TRANSITION METALS;

CURRENT LEVELS; ELECTRIC-PULSE-INDUCED RESISTIVE SWITCHING; RESISTANCE VALUES; RESISTIVE SWITCHING;

THIN FILMS;

EID: 22144448904     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1968416     Document Type: Article

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