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Volumn 208, Issue 9, 2011, Pages 2028-2032

Effect of argon addition on the growth of thick single crystal diamond by high-power plasma CVD

Author keywords

argon addition; plasma simulation; plasma spectroscopy; single crystal diamond

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CRYSTAL MORPHOLOGIES; CRYSTAL QUALITIES; GAS TEMPERATURE; GASPHASE; HIGH-POWER; MICROWAVE POWER; PLASMA POWER; PLASMA SPECTROSCOPY; PLASMA-CVD; POLYCRYSTALLINE DIAMONDS; SINGLE CRYSTAL DIAMOND; SINGLE-CRYSTAL FILMS;

EID: 80052467139     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201100017     Document Type: Article
Times cited : (35)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.