Effects of argon and oxygen addition to the CH4-H2 feed gas on diamond synthesis by microwave plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 39-46

  Han, Young Soo ^a   Kim, Yoon Kee ^a   Lee, Jai Young ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Argon; Chemical vapor deposition (CVD); Diamond; Oxygen

Indexed keywords

ADDITION REACTIONS; ARGON; CHEMICAL VAPOR DEPOSITION; HYDROGEN; METHANE; OXYGEN; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SYNTHESIS (CHEMICAL);

FEED GASES; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0031272414     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00339-8     Document Type: Article

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