Surface micromachined tunable 1.55 μm-VCSEL with 102nm continuous single-mode tuning

Optics Express

Volumn 19, Issue 18, 2011, Pages 17336-17343

  Gierl, C ^a   Gruend, T ^a,b   Debernardi, P ^c   Zogal, K ^a   Grasse, C ^b   Davani, H A ^a   Bohm G ^b   Jatta, S ^a   Kuppers F ^a   Meissner P ^a   Amann, M C ^b  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

^c Istituto di Elettronica e di Ingegneria dell'Informazione e Delle Telecomunicazioni   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; MIRRORS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SURFACE EMITTING LASERS; SURFACES;

LOW COSTS; LOW TEMPERATURES; MASS PRODUCTION; MECHANICAL ACTUATIONS; MICROMACHINED; ON-WAFER; OPTICAL OUTPUT POWER; SIDE MODE SUPPRESSION RATIOS; SINGLE MODE; TUNING RANGES; VERTICAL-CAVITY SURFACE EMITTING LASER; WAVELENGTH TUNING;

TUNING;

EID: 80052210467     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.017336     Document Type: Article

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