Structure and tribological property of MoSx-CrTiAlN film by unbalanced magnetron sputtering

Vacuum

Volumn 86, Issue 2, 2011, Pages 171-177

  Shi, Yongjing ^a,b   Pan, Fusheng ^a   Long, Siyuan ^a   Wang, Weiqing ^a   Zhu, Guangjun ^b  

^a CHONGQING UNIVERSITY   (China)

^b CHONGQING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

MoSx CrTiAlN film; Structural property; Tribological property; Unbalanced magnetron sputtering

Indexed keywords

AMORPHOUS STATE; APPLIED LOADS; COEFFICIENT OF FRICTIONS; CRTIALN; MG ALLOY; MIXED MICROSTRUCTURES; MOSX-CRTIALN FILM; TRIBOLOGICAL PROPERTIES; UNBALANCED MAGNETRON SPUTTERING; X-RAY PHOTOELECTRONS;

MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION;

STRUCTURAL PROPERTIES;

EID: 80051789593     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.05.010     Document Type: Article

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