SCOPUS 정보 검색 플랫폼

Volumn 84, Issue 7, 2010, Pages 962-968

Deposition of nano-scaled CrTiAlN multilayer coatings with different negative bias voltage on Mg alloy by unbalanced magnetron sputtering

(4) Shi, Yongjing a,b Long, Siyuan b Yang, Shicai c Pan, Fusheng b

a CHONGQING UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b CHONGQING UNIVERSITY (China)

c TEER COATINGS LTD (United Kingdom)

Author keywords

Bias voltage; CrTiAlN multilayer coatings; Deposition structure; Friction coefficient

Indexed keywords

ALN; ATOMIC CONCENTRATION; CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING; CR CONCENTRATION; CROSS-SECTIONAL MORPHOLOGY; CRTIALN; CRYSTALLOGRAPHIC STRUCTURE; DEPOSITION MODELS; FACE-CENTERED CUBIC; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FRICTION COEFFICIENT; FRICTION COEFFICIENTS; ION PLATING SYSTEMS; MAGNETRON SPUTTERING SYSTEMS; MG ALLOY; MULTI-LAYER-COATING; NEGATIVE BIAS; NEGATIVE SUBSTRATES; OPTICAL EMISSIONS; PROCESS PARAMETERS; STRUCTURE AND PROPERTIES; UNBALANCED MAGNETRON SPUTTERING; X-RAY PHOTOELECTRONS; XPS; XRD ANALYSIS;

BIAS VOLTAGE; CHROMIUM; DEPOSITION; FIELD EMISSION; FIELD EMISSION MICROSCOPES; FRICTION; INORGANIC COATINGS; ION IMPLANTATION; MAGNETRONS; MULTILAYERS; OPTICAL MULTILAYERS; PLATING; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; TRIBOLOGY; X RAY DIFFRACTION;

CHROMATE COATINGS;

EID: 77249113734 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2010.01.028 Document Type: Article

Times cited : (21)

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