|
Volumn 649, Issue 1, 2011, Pages 169-171
|
Hard X-ray nano-focusing with Montel mirror optics
|
Author keywords
Achromatic; Hard X ray nano focusing; Montel mirrors
|
Indexed keywords
ACHROMATIC;
DEMAGNIFICATION;
FOCAL SPOT;
FOCUSING SYSTEM;
HARD X RAY;
K-B MIRROR ARRANGEMENT;
KIRKPATRICK-BAEZ MIRROR;
MIRROR OPTICS;
MONOCHROMATIC BEAM;
MONTEL MIRRORS;
NANO SCALE;
NANO-FOCUSING;
SYNCHROTRON BEAMLINES;
THIRD GENERATION;
TWO MIRRORS;
VERTICAL DIRECTION;
WORKING DISTANCES;
X RAY BEAM;
MIRRORS;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
OCCUPATIONAL RISKS;
SYNCHROTRON RADIATION;
SYNCHROTRONS;
X RAYS;
FOCUSING;
|
EID: 79961172338
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2010.11.080 Document Type: Conference Paper |
Times cited : (12)
|
References (12)
|