The different initial oxidation kinetics of Zr(0001) and Zr(1010) surfaces

Journal of Applied Physics

Volumn 110, Issue 2, 2011, Pages

  Bakradze, Georgijs ^a   Jeurgens, Lars P H ^a   Mittemeijer, Eric J ^a,b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IN-SITU; INITIAL OXIDATION; ION SPUTTERING; OXIDATION RATES; OXIDATION TEMPERATURE; OXYGEN DIFFUSIVITY; PARTIAL OXYGEN PRESSURES; TEMPERATURE RANGE; THERMALLY ACTIVATED; X RAY PHOTOEMISSION SPECTROSCOPY;

DISSOLUTION; EMISSION SPECTROSCOPY; GROWTH KINETICS; KINETICS; OXIDATION; OXIDE FILMS; OXYGEN; SINGLE CRYSTAL SURFACES; SPECTROSCOPIC ELLIPSOMETRY;

ZIRCONIUM;

EID: 79961106630     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3608044     Document Type: Article

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