Silicon thin film powder samples for electron spin resonance investigation: Role of substrate and preparation procedure

Japanese Journal of Applied Physics

Volumn 50, Issue 7 PART 1, 2011, Pages

  Xiao, Lihong ^a   Astakhov, Oleksandr ^a   Finger, Friedhelm ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PROCEDURES; DIFFERENT SUBSTRATES; EXPOSURE-TIME; GEOMETRICAL CONSTRAINTS; LOW SIGNAL-TO-NOISE RATIO; METAL SUBSTRATE; MICROCRYSTALLINE THIN FILMS; POWDER SAMPLES; PREPARATION PROCEDURES; SAMPLE PREPARATION; SILICON FILMS; SILICON MATERIALS; SILICON THIN FILM; SPIN DENSITIES; TEMPORARY SUBSTRATES; THIN FILM SILICON; ZNO;

AMORPHOUS FILMS; AMORPHOUS SILICON; ELECTRON SPIN RESONANCE SPECTROSCOPY; EXPERIMENTS; FILM THICKNESS; GLASS; MICROCRYSTALLINE SILICON; MOLYBDENUM; POWDER METALS; RESONANCE; SEMICONDUCTING SILICON COMPOUNDS; SIGNAL TO NOISE RATIO; SPIN DYNAMICS; SPIN GLASS; SUBSTRATES; THIN FILMS; ZINC OXIDE;

FILM PREPARATION;

EID: 79960677346     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.071301     Document Type: Article

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