Stiffness properties of porous silicon nanowires fabricated by electrochemical and laser-induced etching

Superlattices and Microstructures

Volumn 50, Issue 2, 2011, Pages 119-127

  Omar, Khalid ^a   Al Douri, Y ^b   Ramizy, Asmiet ^a   Hassan, Z ^a  

^a SCHOOL OF PHYSICS   (Malaysia)

^b UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Chemical etching; Elasticity; Laser induced etching; Nanowire; Stiffness

Indexed keywords

BLUE SHIFT; CHEMICAL ETCHING; CRYSTALLINTY; ETCHED SURFACE; LASER-INDUCED ETCHING; OPTICAL ANALYSIS; OPTICAL DIELECTRIC CONSTANT; SHORT-RANGE FORCES; SILICON NANOSTRUCTURES; SILICON NANOWIRES; STIFFNESS PROPERTIES;

ELASTICITY; ELECTROCHEMICAL PROPERTIES; INVESTMENTS; NANOWIRES; POROUS SILICON; REFRACTIVE INDEX; STIFFNESS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ELECTROCHEMICAL ETCHING;

EID: 79960363205     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2011.05.008     Document Type: Article

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