Structural, optical, and electrical properties of E-beam and sputter-deposited ITO films for LED applications

Electronic Materials Letters

Volumn 7, Issue 2, 2011, Pages 145-149

  Kim, Kyoung Kook ^a   Kim, Hyunsoo ^b   Lee, Sung Nam ^a   Cho, Soohaeng ^c  

^a Korea Polytechnic University   (South Korea)

^b Chonbuk National University   (South Korea)

^c Yonsei University Wonju   (South Korea)

Author keywords

annealing temperature; e beam; ITO film; LED; optical transmittance; resistivity; sputter

Indexed keywords

ANNEALING TEMPERATURES; AVERAGE GRAIN SIZE; E-BEAM; HIGH TRANSMITTANCE; INDIUM TIN OXIDE; ITO FILMS; POST DEPOSITION ANNEALING; SPECIFIC CONTACT RESISTANCES; SPUTTER; STRUCTURAL AND OPTICAL PROPERTIES;

ANNEALING; ELECTRIC PROPERTIES; GALLIUM NITRIDE; LIGHT EMITTING DIODES; OPTICAL PROPERTIES; OXIDE FILMS; TIN;

OPTICAL FILMS;

EID: 79960117142     PISSN: 17388090     EISSN: 20936788     Source Type: Journal    
DOI: 10.1007/s13391-011-0610-0     Document Type: Article

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