Effect of thermal annealing on the structural and optical properties of ZnO thin films deposited by the reactive e-beam evaporation technique

Physica Scripta

Volumn 82, Issue 6, 2010, Pages

  Mahmood, A ^a   Ahmed, Nadeem ^b   Raza, Q ^a   Muhammad Khan, Taj ^a   Mehmood, M ^b   Hassan, M M ^b   Mahmood, N ^c  

^a National Institute of Lasers and Optronics   (Pakistan)

^b PAKISTAN INSTITUTE OF ENGINEERING AND APPLIED SCIENCES   (Pakistan)

^c Optics Laboratories   (Pakistan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; AFM; ANNEALING TEMPERATURES; AS-DEPOSITED THIN FILMS; CRYSTALLINITIES; GRAIN SIZE; OPTICAL CHARACTERIZATION; POST-DEPOSITION; POSTDEPOSITION HEAT TREATMENT; REACTIVE E-BEAM EVAPORATION; RESIDUAL COMPRESSIVE STRESS; STRESS FORMATION; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURAL CHARACTERIZATION; THERMAL-ANNEALING; THIN-FILM DEPOSITIONS; XRD; ZNO; ZNO THIN FILM;

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; DEPOSITION; ENERGY GAP; FILM PREPARATION; GRAIN SIZE AND SHAPE; LIGHT TRANSMISSION; MORPHOLOGY; OXIDE FILMS; PHASE TRANSITIONS; SURFACE MORPHOLOGY; TENSILE STRESS; THERMAL EVAPORATION; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 79960051232     PISSN: 00318949     EISSN: 14024896     Source Type: Journal    
DOI: 10.1088/0031-8949/82/06/065801     Document Type: Article

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