Effect of as-deposited residual stress on transition temperatures of VO2 thin films

Journal of Materials Research

Volumn 19, Issue 8, 2004, Pages 2306-2314

  Tsai, Kuang Yue ^a   Chin, Tsung Shune ^a   Shieh, Han Ping D ^b   Ma, Cheng Hsin ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; ELECTRON SPECTROSCOPY; MAGNETRON SPUTTERING; PHASE TRANSITIONS; RESIDUAL STRESSES; SINGLE CRYSTALS; TENSILE STRESS; THERMAL CYCLING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CORE ELECTRONS; PHASE CHANGE; TRANSITION TEMPERATURES;

VANADIUM COMPOUNDS;

EID: 4644296321     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0299     Document Type: Article

References (22)

1. 2. J. Solid State Chem. 3, 490 (1971).
2. 2 thin films. Adv. Mater. 9, 244 (1997).
3. 5 targets. Jpn. J. Appl. Phys. 39, 6016 (2000).
4. M.G. Krishna, Y. Debauge, and A.K. Bhattacharya: X-ray photoelectron spectroscopy and spectral transmittance study of stoichiometry in sputtered vanadium oxide films. Thin Solid Films 312, 116 (1998).
5. C.H. Griffiths and H.K. Eastwood: Influence of stoichiometry on the metal-semiconductor transition in vanadium dioxide. J. Appl. Phys. 45, 2201 (1974).
6. 2 thin film and its direct optical bit recording characteristics. Appl. Opt. 22, 265 (1983).
7. thin films. J. Vac. Sci. Technol. A 2, 301 (1984).
8. 2 thin films. Appl. Phys. Lett. 71, 3649 (1997).
9. 2 Nanopowders. J. Solid State Chem. 156, 274 (2001).
10. 2 sol-gel films. J. Mater. Chem. 6, 505 (1996).
11. 2 thin films. Thin Solid Films 353, 40 (1999 ).
12. 2 thin films. J. Mater. Sci. 28, 2177 (1993).
13. 2 thin films. Optical Processing Systems 185, 97 (1978).
14. : Electrical and infrared properties. J. Phys. Chem. Solids 62, 1229 (2001).
15. 2 substrates. J. Phys. Chem. Solids 63, 965 (2002 ).
16. F.C. Case: Influence of ion beam parameters on the electrical and optical properties of ion-assisted reactively evaporated vanadium dioxide films. J. Vac. Sci. Technol. A 5, 1762 (1987).
17. C.H. Ma, J.H. Huang, and Haydn Chen: Residual stress measurement in textured thin film by grazing-incidence x-ray diffraction. Thin Solid Films 418, 73 (2002).
18. G.A. Sawatzky and D. Post: X-ray photoelectron and Auger spectroscopy study of some vanadium oxides. Phys. Rev. B 20, 1546 (1979).
19. 2 thin films studied by photoelectron spectroscopy. Thin Solid Films 287, 134 (1996).
20. J.D. Finegan and R.W. Hoffman: Stress anisotropy in evaporated iron films. J. Appl. Phys. 30, 597 (1959).
21. F.A. Doljack and R.W. Hoffman: The origins of stress in thin nickel films. Thin Solid Films 12, 71 (1972).
22. 2 with thin chromium films studied by internal stress measurements. Thin Solid Films 89, 133 (1982).