Composition dependence of unipolar resistance switching in TaOx thin films

Physica Status Solidi - Rapid Research Letters

Volumn 5, Issue 7, 2011, Pages 253-255

  Kurnia, F ^a   Hadiyawarman, ^a   Jung, C U ^a   Jung, Ranju ^b   Liu, Chunli ^a  

^a Hankuk University of Foreign Studies   (South Korea)

^b Kwangwoon University   (South Korea)

Author keywords

Pulsed laser deposition; Resistance switching; Ta2O5; X ray photoelectron spectroscopy

Indexed keywords

COMPOSITION DEPENDENCE; CRITICAL EFFECTS; FILM COMPOSITION; RESISTANCE SWITCHING; ROOM TEMPERATURE;

FILM GROWTH; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; PLATINUM; PULSED LASER DEPOSITION; TANTALUM OXIDES; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

SWITCHING;

EID: 79959988439     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201105253     Document Type: Article

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