Study of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Schmidtova Tereza T ^a   Soucek, Pavel ^a   Vašina, Petr ^a   Schäfer, Jan ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b INP Greifswald   (Germany)

Author keywords

Hybrid PVD PECVD process; Hysteresis; Modelling; Reactive magnetron sputtering

Indexed keywords

CARBON TARGETS; COSPUTTERING; EXPERIMENTAL MEASUREMENTS; HYBRID DEPOSITION; HYBRID PROCESS; HYBRID PVD-PECVD PROCESS; HYDROGENATED CARBON; METAL CARBIDES; MODELLING; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; REACTIVE MAGNETRON SPUTTERING; STEADY-STATE CONDITION; TARGET SPUTTERING; TI SPUTTERING; TITANIUM TARGETS;

ACETYLENE; ARGON; CARBIDES; LIGHTING; MAGNETRON SPUTTERING; ORGANIC COMPOUNDS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM;

CHEMICAL VAPOR DEPOSITION;

EID: 79959811636     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.02.047     Document Type: Article

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