Reactive gas control of non-stable plasma conditions

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 34-39

  Bellido Gonzalez V ^a   Daniel, B ^a   Counsell, J ^a   Monaghan, D ^a  

^a Gencoa Ltd   (United Kingdom)

Author keywords

Feedback control; PEM; Reactive; Sputtering

Indexed keywords

PLASMA SOURCES; PROCESS CONTROL; SPUTTERING; SUBSTRATES; VACUUM APPLICATIONS;

PEM; PLASMA EMISSION; REACTIVE; RESPONSE TIMES;

PLASMAS;

EID: 33344475096     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.230     Document Type: Conference Paper

References (7)

1. J. Chapin, C.R. Condon, US Patent 4 166 (1979) 784.
2. S. Berg, H.-O. Blom, T. Larsson, and C. Nender J. Vac. Sci. Technol. A5 2 1987 202
3. T. Larsson, H.-O. Blom, C. Nender, and S. Berg J. Vac. Sci. Technol. A6 3 1988 1832
4. S. Berg, T. Larsson, C. Nender, and HO. Blom J. Appl. Phys. 63 3 1988 887
5. S.J. Nadel, and P. Greene Int. Glass Rev. 3 2001 45
6. R.M. Phelan Pseudo-Derivative-Feedback (PDF) Control, UCRL-51036, University of California, Laurence Livermore Laboratory 1971
7. R.M. Phelan Automatic Control Systems 1st ed. 1977 Cornell University Press Ithaca