Description of a hybrid PECVD-PVD process: Application to Zn-Si-O and Ti-Si-O composites thin films

Applied Surface Science

Volumn 253, Issue 24, 2007, Pages 9323-9329

  Daniel, A ^a   Duguet, T ^a   Belmonte, T ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

HMDSO; Hybrid process; PECVD; Sputtering; Titanium oxide; Zinc oxide

Indexed keywords

COMPOSITE MATERIALS; FLOW RATE; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTERING; TITANIUM; VAPORS; ZINC OXIDE;

COMPOSITE THIN FILMS; CRITICAL VALUE; HYBRID PROCESS;

THIN FILMS;

EID: 34548501803     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.05.063     Document Type: Article

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