Sputter deposition of thin films on different substrate materials analyzed by means of modulated IR radiometry

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Macedo, Francisco ^a   Chotikaprakhan, Sutharat ^b   Kijamnajsuk, Puchong ^b,c   Vaz, Filipe ^a   Faria, Roberto T ^a,d   Gibkes, Juergen ^c   Pelzl, Josef ^c   Bein, Bruno K ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b KASETSART UNIVERSITY   (Thailand)

^c RUHR UNIVERSITY BOCHUM   (Germany)

^d UNIVERSIDADE ESTADUAL DO NORTE FLUMINENSE DARCY RIBEIRO   (Brazil)

Author keywords

Modulated IR radiometry; Si and glass; Sputter deposition; Substrate preparation; Substrates of stainless steel; Thin films

Indexed keywords

BIASING EFFECTS; COATING-SUBSTRATE; DEPOSITION PROCESS; DEPTH-RESOLVED; DIFFERENT SUBSTRATES; DIFFERENT THICKNESS; HEAT TRANSPORT; IR RADIOMETRY; MILLIMETER RANGE; MODULATION FREQUENCIES; MULTI-LAYER SYSTEM; PRE-TREATMENT; SPUTTER-DEPOSITED THIN FILMS; SUBMICRON; SUBSTRATE PREPARATION; THERMAL MEASUREMENTS; THERMAL TRANSPORT PROPERTIES; XRD; ZRN FILMS;

COATINGS; DEPOSITION; GLASS; INTERFACES (MATERIALS); RADIOMETERS; RADIOMETRY; STAINLESS STEEL; THIN FILMS; TRANSPORT PROPERTIES; VAPOR DEPOSITION;

SUBSTRATES;

EID: 79959798634     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.038     Document Type: Article

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