|
Volumn 82, Issue 12, 2008, Pages 1457-1460
|
Modulated IR radiometry of (TiSi)N thin films
|
Author keywords
Bias voltage; Coatings; IR radiometry; Photothermal; Sputtering; Surface roughness; Thermal properties; Ti Si N
|
Indexed keywords
CORRELATION METHODS;
FRICTION;
RADIOMETERS;
RADIOMETRY;
REACTIVE SPUTTERING;
SPUTTER DEPOSITION;
SURFACE CHEMISTRY;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
THERMODYNAMIC PROPERTIES;
THICK FILMS;
THIN FILMS;
TITANIUM COMPOUNDS;
TRANSPORT PROPERTIES;
BIAS VOLTAGE;
COATINGS;
CONTACTLESS;
DC REACTIVE MAGNETRON SPUTTERING;
DEPOSITION CONDITIONS;
EMPIRICAL CORRELATIONS;
GRAIN SIZES;
GROWTH PROCESSES;
IR RADIOMETRY;
PHOTOTHERMAL;
PHYSICAL PARAMETERS;
SPUTTERING;
SURFACE ROUGHNESS EFFECTS;
THERMAL PROPERTIES;
THERMAL TRANSPORT;
THREE-LAYER MODELS;
TI-SI-N;
TWO-LAYER MODELS;
MAGNETRON SPUTTERING;
|
EID: 49149127149
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2008.03.066 Document Type: Article |
Times cited : (17)
|
References (8)
|