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Volumn 16, Issue SUPPL., 2006, Pages
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Photocatalytic degradation characteristic of amorphous TiO2-W thin films deposited by magnetron sputtering
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Author keywords
Amorphous TiO2; Magnetron sputtering; Photocatalysis; Threshold; TiO2 W thin films
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
MAGNETRON SPUTTERING;
PHOTOCATALYSIS;
PHOTODEGRADATION;
THIN FILMS;
TITANIUM DIOXIDE;
TUNGSTEN;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELLIPSE POLARIZATION APPARATUS;
METHYLENE BLUE;
AMORPHOUS FILMS;
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EID: 33746785172
PISSN: 10036326
EISSN: None
Source Type: Journal
DOI: 10.1016/S1003-6326(06)60191-X Document Type: Article |
Times cited : (10)
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References (11)
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