Microstructural evolution and phase development of Nb and Y doped TiO 2 films prepared by RF magnetron sputtering

Applied Surface Science

Volumn 229, Issue 1-4, 2004, Pages 140-147

  Wang, Sea Fue ^a   Hsu, Yung Fu ^a   Lee, Ruey Long ^a   Lee, Yi Shiang ^a  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Deposition parameters; Microstructural evolution; Phase formation; TiO 2 film

Indexed keywords

ANNEALING; COATINGS; DEPOSITION; DOPING (ADDITIVES); GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROSTRUCTURE; REFRACTIVE INDEX; SOLAR CELLS; SURFACE ROUGHNESS; TITANIUM DIOXIDE; YTTRIUM;

DEPOSITION PARAMETERS; MICROSTRUCTURAL EVOLUTION; PHASE FORMATION; TIO2 FILMS;

NIOBIUM;

EID: 2342537740     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.01.055     Document Type: Article

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