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Volumn 42, Issue 6-7, 2010, Pages 970-973

Structure and properties of nitrogen-doped titanium dioxide thin films produced by reactive magnetron sputtering

Author keywords

Electron spectroscopy; Nitrogen doping; Photocatalysis; Titanium dioxide

Indexed keywords

BAND EDGE; BAND GAPS; IMPURITY STATE; METAL OXIDES; NITROGEN-DOPED; NITROGEN-DOPED TITANIUM DIOXIDE THIN FILM; NITROGEN-DOPING; OXYGEN GAS; POST ANNEALING; PURIFICATION TECHNIQUES; REACTIVE MAGNETRON SPUTTERING; REFLECTION ELECTRON ENERGY LOSS SPECTROSCOPIES; STRUCTURE AND PROPERTIES; TIO; TITANIUM TARGETS; TOXIC SUBSTANCES; ULTRAVIOLET REGION; VISIBLE-LIGHT ACTIVITY; VISIBLE-LIGHT IRRADIATION;

EID: 77954283073     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3220     Document Type: Conference Paper
Times cited : (14)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.