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Volumn 42, Issue 6-7, 2010, Pages 970-973
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Structure and properties of nitrogen-doped titanium dioxide thin films produced by reactive magnetron sputtering
a
UMR 6630 CNRS
(France)
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Author keywords
Electron spectroscopy; Nitrogen doping; Photocatalysis; Titanium dioxide
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Indexed keywords
BAND EDGE;
BAND GAPS;
IMPURITY STATE;
METAL OXIDES;
NITROGEN-DOPED;
NITROGEN-DOPED TITANIUM DIOXIDE THIN FILM;
NITROGEN-DOPING;
OXYGEN GAS;
POST ANNEALING;
PURIFICATION TECHNIQUES;
REACTIVE MAGNETRON SPUTTERING;
REFLECTION ELECTRON ENERGY LOSS SPECTROSCOPIES;
STRUCTURE AND PROPERTIES;
TIO;
TITANIUM TARGETS;
TOXIC SUBSTANCES;
ULTRAVIOLET REGION;
VISIBLE-LIGHT ACTIVITY;
VISIBLE-LIGHT IRRADIATION;
ARGON;
CHEMICAL PROPERTIES;
ELECTRON ENERGY ANALYZERS;
ENERGY DISSIPATION;
IMPURITIES;
METAL REFINING;
MICROSTRUCTURE;
NITROGEN;
OPTICAL PROPERTIES;
OXIDES;
OXYGEN;
PHOTOCATALYSIS;
SEMICONDUCTOR DOPING;
TITANIUM;
TITANIUM DIOXIDE;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELECTRON ENERGY LOSS SPECTROSCOPY;
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EID: 77954283073
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.3220 Document Type: Conference Paper |
Times cited : (14)
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References (20)
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