Metal-organic chemical vapor deposition and nanoscale characterization of zirconium oxide thin films

Thin Solid Films

Volumn 414, Issue 2, 2002, Pages 199-204

  Harasek, S ^a   Wanzenboeck, H D ^a   Basnar, B ^a   Smoliner, J ^a   Brenner, J ^a   Stoeri, H ^a   Gornik, E ^a   Bertagnolli, E ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Atomic force microscopy; Auger electron spectroscopy; Chemical vapor deposition; Surface roughness; Zirconium

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DIELECTRIC FILMS; FILM GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; ZIRCONIA;

ATOMIC LAYER DEPOSITION;

THIN FILMS;

EID: 0037158422     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00510-2     Document Type: Article

References (19)