Influences of oxygen partial pressure on structure and related properties of ZrO 2 thin films prepared by electron beam evaporation deposition

Applied Surface Science

Volumn 254, Issue 2, 2007, Pages 552-556

  Shen, Yanming ^a,b   Shao, Shuying ^a   Yu, Hua ^a,b   Fan, Zhengxiu ^a   He, Hongbo ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Electron beam evaporation; Oxygen partial pressure; Residual stress; ZrO 2 thin films

Indexed keywords

ELECTRON ABSORPTION; EVAPORATION; OXYGEN; PARTIAL PRESSURE; X RAY DIFFRACTION; ZIRCONIA;

ELECTRON BEAM EVAPORATION DEPOSITION; PACKING DENSITIES; SURFACE THERMAL LENSING TECHNIQUE (STL);

THIN FILMS;

EID: 35348928688     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.06.029     Document Type: Article

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