Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature

Rare Metals

Volumn 30, Issue 2, 2011, Pages 170-174

  Liu, Baoting ^a   Zhou, Yang ^a   Zheng, Hongfang ^b   Li, Man ^a   Guo, Zhe ^a   Zhao, Qingxun ^a   Peng, Yingcai ^a  

^a HEBEI UNIVERSITY   (China)

^b BAODING UNIVERSITY   (China)

Author keywords

Magnetron sputtering; Optical properties; Oxygen; Structural properties; Thin films; Zinc oxide

Indexed keywords

CRYSTALLINE GRAINS; CRYSTALLINE QUALITY; GRAIN SIZE; GROWING PROCESS; INFLUENCE OF OXYGEN; MEASURING SYSTEMS; OXYGEN ANION; OXYGEN GAS; RADIO FREQUENCY MAGNETRON SPUTTERING; RE-SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; STRUCTURAL AND OPTICAL PROPERTIES; SURFACE PROFILES; UV SPECTROPHOTOMETRY; ZNO; ZNO FILMS; ZNO THIN FILM;

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; GASES; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OXIDE FILMS; OXYGEN; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 79958790088     PISSN: 10010521     EISSN: 18677185     Source Type: Journal    
DOI: 10.1007/s12598-011-0219-3     Document Type: Article

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