Pulsed laser deposition of low-resistivity indium tin oxide thin films at low substrate temperature

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 5 A, 1999, Pages 2710-2716

  Adurodija, Frederick Ojo ^a   Izumi, Hirokazu ^a,b   Ishihara, Tsuguo ^a   Yoshioka, Hideki ^a   Matsui, Hiroshi ^a   Motoyama, Muneyuki ^a  

^a Hyogo Prefectural Institute of Industrial Research Technical Center for Machinery and Metals   (Japan)

^b New Energy Industrial Development Organization   (Japan)

Author keywords

Excimer pulsed laser deposition; Indium tin oxide; ITO; Optoelectrical properties; Structural properties; Thin film; Transparent conducting oxides

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; FUSED SILICA; LIGHT TRANSMISSION; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON WAFERS; THERMAL EFFECTS; THIN FILMS;

INDIUM TIN OXIDE; PULSED LASER DEPOSITION (PLD);

SEMICONDUCTING FILMS;

EID: 0032648962     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.2710     Document Type: Article

References (12)

1. J. C. C. Fan and F. J. Bacher: J. Electrochem. Soc. 122 (1975) 1719.
2. H. Kobayashi, T. Ishida, Y. Nakato and H. Tsubomura: J. Appl. Phys. 69 (1991) 1736.
3. I. Hamberg and C. G. Granqvist: J. Appl. Phys. 60 (1996) R123.
4. S. Takaki, K. Matsumoto and K. Suzuki: Appl. Surf. Sci. 33/34 (1988) 919.
5. P. Nath, R. F. Bunshah, B. M. Masel and O. M. Stuffesud: Thin Solid Films 72 (1980) 463.
6. R. B. H. Tahar, T. Ban, Y. Ohya and Y. Takahashi: J. Appl. Phys. 83 (1998) 2631.
7. D. B. Chrisey and G. K. Hubler: Pulsed Laser Deposition of Thin Films (John Wiley & Sons, New York, 1994).
8. J. P. Zheng and H. S. Kwok: Thin Solid Films 232 (1993) 99.
9. J. P. Zheng and H. S. Kwok: Appl. Phys. Lett. 63 (1993) 1.
10. F. Hanus, A. Jadin and L. D. Laudc: Appl. Surf. Sci. 96-98 (1996) 807.
11. C. V. R. Vasant Kumar and A. Mansingh: J. Appl. Phys. 65 (1989) 1270.
12. Q. X. Jia, J. P. Zheng, H. S. Kwok and W. A. Anderson: Thin Solid Films 258 (1995) 260.