Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure

Carbon

Volumn 49, Issue 11, 2011, Pages 3672-3678

  Dong, Xiaochen ^a   Wang, Peng ^a   Fang, Wenjing ^c   Su, Ching Yuan ^d   Chen, Yu Hsin ^d   Li, Lain Jong ^d   Huang, Wei ^a   Chen, Peng ^b  

^a NANJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b Nanyang Technological University   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^d RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CVD; CONFOCAL RAMAN; COPPER FOILS; ELECTRICAL CONDUCTIVITY; ELECTRICAL MEASUREMENT; GRAPHENE LATTICES;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; DEFECT DENSITY; ELECTRIC CONDUCTIVITY; ETHANOL; GALVANOMAGNETIC EFFECTS; GRAPHENE; HALL MOBILITY; LIQUIDS; OPTICAL MICROSCOPY; PARAFFINS; SCANNING TUNNELING MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 79958295566     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.04.069     Document Type: Article

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