XPS and AFM characterization of the self-assembled molecular monolayers of a 3-aminopropyltrimethoxysilane on silicon surface, and effects of substrate pretreatment by UV-irradiation

Surface and Interface Analysis

Volumn 43, Issue 7, 2011, Pages 1082-1088

  Cui, Nai Yi ^a   Liu, Chaozong ^b   Yang, Wantai ^c  

^a NORTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

^b ROBERT GORDON UNIVERSITY   (United Kingdom)

^c BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

3 aminopropyltrimethoxysilane; AFM; self assembly; UV irradiation; XPS

Indexed keywords

3-AMINOPROPYL TRIMETHOXYSILANE; AFM; AMINOPROPYLTRIMETHOXYSILANE; ASSEMBLING PROCESS; ASSEMBLY PROCESS; DEGREE OF DISORDER; MOLECULAR MONOLAYER; MOLECULAR PACKINGS; OXYGEN-CONTAINING SPECIES; PRE-TREATMENT; SELF-ASSEMBLED; SELF-ASSEMBLY REACTIONS; SILICON (111) SURFACE; SILICON SUBSTRATES; SILICON SURFACES; SUBSTRATE PRETREATMENT; SUBSTRATE SURFACE; SURFACE FUNCTIONALITIES; ULTRA-VIOLET; UV IRRADIATION;

ATOMIC FORCE MICROSCOPY; IRRADIATION; MOLECULAR OXYGEN; SELF ASSEMBLY; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLED MONOLAYERS;

EID: 79958198062     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3698     Document Type: Article

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