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Volumn 29, Issue 3, 2011, Pages

Effects of silicon nitride passivation on isolation-blocking voltage in algan/gan high electron mobility transistors

Author keywords

[No Author keywords available]

Indexed keywords

DRAIN CURRENT; ELECTRIC BREAKDOWN; ELECTRON MOBILITY; GALLIUM NITRIDE; ION BOMBARDMENT; IONS; NITROGEN PLASMA; PASSIVATION; SILICON NITRIDE;

EID: 79958113058     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3593002     Document Type: Article
Times cited : (13)

References (17)
  • 8
    • 0035278795 scopus 로고    scopus 로고
    • Microwave performance of AlGaN/GaN metal insulator semiconductor field effect transistors on sapphire substrates
    • DOI 10.1109/16.906429, PII S0018938301014460
    • E. M. Chumbes, J. A. Smart, T. Prunty, and J. R. Shealy, IEEE Trans. Electron Devices 0018-9383 48, 416 (2001). 10.1109/16.906429 (Pubitemid 32271155)
    • (2001) IEEE Transactions on Electron Devices , vol.48 , Issue.3 , pp. 416-419
    • Chumbes, E.M.1    Smart, J.A.2    Prunty, T.3    Shealy, J.R.4
  • 16
  • 17
    • 0023438107 scopus 로고
    • Electrical properties of thin pecvd silicon oxynitride films
    • DOI 10.1016/0169-4332(87)90094-8
    • L. Do Thanh, V. Exner, and P. Balk, Appl. Surf. Sci. 0169-4332 30, 204 (1987). 10.1016/0169-4332(87)90094-8 (Pubitemid 18538427)
    • (1987) Applied Surface Science , vol.30 , Issue.1-4 , pp. 204-209
    • Do Thanh, L.1    Exner, V.2    Balk, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.