-
1
-
-
0033907629
-
High performance microwave power GaN/AlGaN MODFETs grown by RF-assisted MBE
-
DOI 10.1049/el:20000352
-
N. X. Nguyen, M. Micovic, W. -S. Wong, P. Hashimoto, L. -M. McCray, P. Janke, and C. Nguyen, Electron. Lett. 0013-5194 36, 468 (2000). 10.1049/el:20000352 (Pubitemid 30559617)
-
(2000)
Electronics Letters
, vol.36
, Issue.5
, pp. 468-469
-
-
Nguyen, N.X.1
Micovic, M.2
Wong, W.-S.3
Hashimoto, P.4
McCray, L.-M.5
Janke, P.6
Nguyen, C.7
-
2
-
-
0005985130
-
-
0021-8979, 10.1063/1.371145
-
S. J. Pearton, J. C. Zolper, R. J. Shul, and F. Ren, J. Appl. Phys. 0021-8979 86, 1 (1999). 10.1063/1.371145
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 1
-
-
Pearton, S.J.1
Zolper, J.C.2
Shul, R.J.3
Ren, F.4
-
3
-
-
0035545658
-
Effect of gate length on DC performance of AlGaN/GaN HEMTs grown by MBE
-
DOI 10.1016/S0038-1101(01)00255-6, PII S0038110101002556
-
J. W. Johnson, A. G. Baca, R. D. Briggs, R. J. Shul, C. Monier, F. Ren, S. J. Pearton, A. M. Dabiran, A. M. Wowchack, C. J. Polley, and P. P. Chow, Solid-State Electron. 0038-1101 45, 1979 (2001). 10.1016/S0038-1101(01)00255-6 (Pubitemid 33024403)
-
(2001)
Solid-State Electronics
, vol.45
, Issue.12
, pp. 1979-1985
-
-
Johnson, J.W.1
Baca, A.G.2
Briggs, R.D.3
Shul, R.J.4
Wendt, J.R.5
Monier, C.6
Ren, F.7
Pearton, S.J.8
Dabiran, A.M.9
Wowchack, A.M.10
Polley, C.J.11
Chow, P.P.12
-
4
-
-
0032595863
-
-
0741-3106, 10.1109/55.784448
-
I. Daumiller, C. Kirchner, M. Kamp, K. J. Ebeling, and E. Kohn, IEEE Electron Device Lett. 0741-3106 20, 448 (1999). 10.1109/55.784448
-
(1999)
IEEE Electron Device Lett.
, vol.20
, pp. 448
-
-
Daumiller, I.1
Kirchner, C.2
Kamp, M.3
Ebeling, K.J.4
Kohn, E.5
-
5
-
-
0033738001
-
-
0741-3106, 10.1109/55.843146
-
B. M. Green, K. K. Chu, E. M. Chumbes, J. A. Smart, J. R. Shealy, and L. F. Eastman, IEEE Electron Device Lett. 0741-3106 21, 268 (2000). 10.1109/55.843146
-
(2000)
IEEE Electron Device Lett.
, vol.21
, pp. 268
-
-
Green, B.M.1
Chu, K.K.2
Chumbes, E.M.3
Smart, J.A.4
Shealy, J.R.5
Eastman, L.F.6
-
6
-
-
0035886086
-
-
0003-6951, 10.1063/1.1412282
-
G. Simin, A. Koudymov, A. Tarakji, X. Hu, J. Yang, M. Asif Khan, M. S. Shur, and R. Gaska, Appl. Phys. Lett. 0003-6951 79, 2651 (2001). 10.1063/1.1412282
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 2651
-
-
Simin, G.1
Koudymov, A.2
Tarakji, A.3
Hu, X.4
Yang, J.5
Asif Khan, M.6
Shur, M.S.7
Gaska, R.8
-
7
-
-
0036864577
-
Comparison of surface passivation films for reduction of current collapse in AlGaN/GaN high electron mobility transistors
-
DOI 10.1149/1.1512675
-
B. Luo, R. Mehandru, J. Kim, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, R. Fitch, J. Gillespie, T. Jenkins, J. Sewell, D. Via, A. Crespo, and Y. Irokawa, J. Electrochem. Soc. 0013-4651 149, G613 (2002). 10.1149/1.1512675 (Pubitemid 35457976)
-
(2002)
Journal of the Electrochemical Society
, vol.149
, Issue.11
-
-
Luo, B.1
Mehandru, R.2
Kim, J.3
Ren, F.4
Gila, B.P.5
Onstine, A.H.6
Abernathy, C.R.7
Pearton, S.J.8
Fitch, R.9
Gillespie, J.10
Jenkins, T.11
Sewell, J.12
Via, D.13
Crespo, A.14
Irokawa, Y.15
-
8
-
-
0035278795
-
Microwave performance of AlGaN/GaN metal insulator semiconductor field effect transistors on sapphire substrates
-
DOI 10.1109/16.906429, PII S0018938301014460
-
E. M. Chumbes, J. A. Smart, T. Prunty, and J. R. Shealy, IEEE Trans. Electron Devices 0018-9383 48, 416 (2001). 10.1109/16.906429 (Pubitemid 32271155)
-
(2001)
IEEE Transactions on Electron Devices
, vol.48
, Issue.3
, pp. 416-419
-
-
Chumbes, E.M.1
Smart, J.A.2
Prunty, T.3
Shealy, J.R.4
-
9
-
-
79955997504
-
3 passivation on AlGaN/GaN high-electron-mobility transistors
-
DOI 10.1063/1.1455692
-
B. Luo, J. W. Johnson, J. Kim, R. M. Mehandru, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, A. G. Baca, R. D. Briggs, R. J. Shul, C. Monier, and J. Han, Appl. Phys. Lett. 0003-6951 80, 1661 (2002). 10.1063/1.1455692 (Pubitemid 34268864)
-
(2002)
Applied Physics Letters
, vol.80
, Issue.9
, pp. 1661
-
-
Luo, B.1
Johnson, J.W.2
Kim, J.3
Mehandru, R.M.4
Ren, F.5
Gila, B.P.6
Onstine, A.H.7
Abernathy, C.R.8
Pearton, S.J.9
Baca, A.G.10
Briggs, R.D.11
Shul, R.J.12
Monier, C.13
Han, J.14
-
10
-
-
0035914883
-
-
10.1063/1.1418452
-
P. B. Klein, S. C. Binari, K. Ikossi, A. E. Wickenden, D. D. Koleske, and R. L. Henry, Appl. Phys. Lett. 79, 3527 (2001). 10.1063/1.1418452
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 3527
-
-
Klein, P.B.1
Binari, S.C.2
Ikossi, K.3
Wickenden, A.E.4
Koleske, D.D.5
Henry, R.L.6
-
11
-
-
0347778608
-
-
0361-5235.
-
A. P. Zhang, L. B. Rowland, E. B. Kamensky, V. Tilak, J. C. Grande, J. Feetsov, A. Vatiakhikh, and L. F. Eastman, J. Electron. Mater. 0361-5235 32, 626 (2003).
-
(2003)
J. Electron. Mater.
, vol.32
, pp. 626
-
-
Zhang, A.P.1
Rowland, L.B.2
Kamensky, E.B.3
Tilak, V.4
Grande, J.C.5
Feetsov, J.6
Vatiakhikh, A.7
Eastman, L.F.8
-
12
-
-
78650892694
-
-
0003-6951, 10.1063/1.3533381
-
C. F. Lo T. S. Kang, C. Y. Chang, S. J. Peaton, I. I. Kravchenko, O. Laboutin, J. W. Johnson, and F. Ren, Appl. Phys. Lett. 0003-6951 97, 262116 (2010). 10.1063/1.3533381
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 262116
-
-
Lo, C.F.1
Kang, T.S.2
Chang, C.Y.3
Peaton, S.J.4
Kravchenko, I.I.5
Laboutin, O.6
Johnson, J.W.7
Ren, F.8
-
13
-
-
0033101253
-
-
0018-9383, 10.1109/16.748864
-
T. Kimoto, N. Miyamoto, and H. Matsunami, IEEE Trans. Electron Devices 0018-9383 46, 471 (1999). 10.1109/16.748864
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, pp. 471
-
-
Kimoto, T.1
Miyamoto, N.2
Matsunami, H.3
-
15
-
-
0028743399
-
-
0281-1847, 10.1088/0031-8949/1994/T54/015
-
L. P. Ramberg, S. Savage, U. Gustafsson, and A. Schöner, Phys. Scr., T 0281-1847 T54, 65 (1994). 10.1088/0031-8949/1994/T54/015
-
(1994)
Phys. Scr., T
, vol.54
, pp. 65
-
-
Ramberg, L.P.1
Savage, S.2
Gustafsson, U.3
Schöner, A.4
-
17
-
-
0023438107
-
Electrical properties of thin pecvd silicon oxynitride films
-
DOI 10.1016/0169-4332(87)90094-8
-
L. Do Thanh, V. Exner, and P. Balk, Appl. Surf. Sci. 0169-4332 30, 204 (1987). 10.1016/0169-4332(87)90094-8 (Pubitemid 18538427)
-
(1987)
Applied Surface Science
, vol.30
, Issue.1-4
, pp. 204-209
-
-
Do Thanh, L.1
Exner, V.2
Balk, P.3
|