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Volumn 519, Issue 18, 2011, Pages 6178-6182
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Sputtered hydrogenated amorphous silicon thin films for distributed Bragg reflectors and long wavelength vertical cavity surface emitting lasers applications
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Author keywords
Distributed Bragg reflectors; Microcavity; Multilayers; Optical coatings; Optoelectronics devices; Vertical cavity surface emitting lasers
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Indexed keywords
CONTINUOUS WAVE OPERATION;
DBR;
DEPOSITION PARAMETERS;
GLASS SUBSTRATES;
HIGH REFLECTIVITY;
HYDROGEN DILUTION;
HYDROGENATED AMORPHOUS SILICON THIN FILMS;
LARGE SPECTRAL BANDWIDTH;
LASER EMISSION;
LONG WAVELENGTH VERTICAL CAVITY SURFACE EMITTING LASERS;
OPTICAL MEASUREMENT;
PHOTOPUMPING;
QUARTER-WAVELENGTH;
RADIO FREQUENCY MAGNETRON SPUTTERING;
RESIDUAL ABSORPTION;
ROOM TEMPERATURE;
THEORETICAL CALCULATIONS;
THICK DIELECTRICS;
VERTICAL CAVITY SURFACE EMITTING LASER;
AMORPHOUS FILMS;
BANDWIDTH;
DBR LASERS;
DISTRIBUTED BRAGG REFLECTORS;
FILM PREPARATION;
HYDROGENATION;
LASER PULSES;
OPTICAL COATINGS;
OPTICAL DATA PROCESSING;
PLASMA DEPOSITION;
REFLECTION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON NITRIDE;
SUBSTRATES;
SURFACE EMITTING LASERS;
SURFACE PROPERTIES;
TRANSFER MATRIX METHOD;
AMORPHOUS SILICON;
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EID: 79958087238
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.111 Document Type: Article |
Times cited : (4)
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References (18)
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