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Journal of Non-Crystalline Solids

Volumn 299-302, Issue , 2002, Pages 2-8

Amorphous silicon films and solar cells deposited by HWCVD at ultra-high deposition rates

(6) Mahan, A Harv a Xu, Y a Iwaniczko, E a Williamson, D L b Nelson, B P a Wang, Q a

a NATIONAL RENEWABLE ENERGY LABORATORY (United States)

b Department of Geology and Geological Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRONIC STRUCTURE; FILM GROWTH; HYDROGENATION; RAMAN SPECTROSCOPY; SILANES; SOLAR CELLS; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

AMORPHOUS SILICON FILMS; MICROCRYSTALLINE SILICON;

AMORPHOUS FILMS;

EID: 0036540218 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(02)00927-4 Document Type: Article

Times cited : (26)

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