Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

Optics Communications

Volumn 282, Issue 9, 2009, Pages 1767-1770

  Selvaraja, Shankar Kumar ^a   Sleeckx, Erik ^b   Schaekers, Marc ^b   Bogaerts, Wim ^a   Thourhout, Dries Van ^a   Dumon, Pieter ^a   Baets, Roel ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

Author keywords

Amorphous silicon; Integrated optics; Waveguides

Indexed keywords

INTEGRATED CIRCUITS; INTEGRATED OPTICS; OPTICAL MATERIALS; PHOTOLITHOGRAPHY; PHOTONICS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SILICON ON INSULATOR TECHNOLOGY; WAVEGUIDES; WIRE;

LOW LOSS; OPTICAL LITHOGRAPHIES; PHOTONIC INTEGRATED CIRCUITRIES; PHOTONIC WIRES; PROPAGATION LOSS MEASUREMENTS; RIDGE WAVEGUIDES; SILICON PHOTONICS; SILICON-ON-INSULATOR TECHNOLOGIES; SINGLE MODES;

AMORPHOUS SILICON;

EID: 62349103314     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2009.01.021     Document Type: Article

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