Enabling the 22nm node via grazing incidence collectors integrated into the DPP source for EUVL HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Bianucci, G ^a   Bragheri, A ^a   Cassol, G L ^a   Ghislanzoni, R ^a   Mazzoleni, R ^a   Zocchi, F E ^a  

^a Media Lario Technologies   (Italy)

Author keywords

collection efficiency; collector; DPP source; EUVL; EUVL scanner; extreme ultraviolet lithography; grazing incidence; grazing incidence collector

Indexed keywords

COLLECTION EFFICIENCY; COLLECTOR; DPP SOURCE; EUVL; EUVL SCANNER; GRAZING INCIDENCE; GRAZING INCIDENCE COLLECTOR;

DEBRIS; DESIGN; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; LOADING; MANUFACTURE; OPTICS; SCANNING;

COLLECTOR EFFICIENCY;

EID: 79957967675     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879396     Document Type: Conference Paper

References (11)

1. Yoshioka, M., Teramoto, Y., Zink, P., Schriever, G., Niimi, G., Corthout, M., "Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments", Proc. SPIE 7636, 763610 (2010).
2. Brandt, D. C, Fomenkov, I., Ershow, A. I., Partlo, W., Myers, D., Böwering, N. R., Farrar,N. R., Vasehenko, G. O., Khodykin, O. V., Bykanov, A. N., Hoffman, J. R., Chrobak, C. P., Srivastava, S. N., Ahmad, I., Rajyaguru, C., Golich, D. J., Vidusek, D. A., De Dea, S., Hou, R. R., "LPP source system development for HVM", Proc. SPIE 7271, 727108 (2009).
3. Endo, A., Komori, H., Ueno, Y., Nowak, K. M., Takayuki, Y., Tatsuya, Y., Suganuma, T., Asayamo, T., Someya, H., Hoshino, H., Nakano, M., Moriya, M., Nishisaka, T., Abe, T., Sumitami, A., Nagano, H., Sasaki, Y., Nagai, S., Watanabe, Y., Soumagne, G., Ishihara, T., Wakabayashy, O., Kakizaki, K., Mizoguchi, H., "Laser-produced plasma source development for EUV lithography", Proc. SPIE 7271, 727103 (2009).
4. Wood, O., Koay, C. S., Petrillo, K., Mizuno, H., Raghunathan, S., Arnold, J., Horak, D., Burkhardt, M., McIntyre, G., Deng, Y., La Fontaine, B., Okoroanyanwu, U., Wallow, T., Landie, G., Standaert, T., Burns, S., Waskiewicz, C., Kawasaki, H., Chen, J. H. C., Colburn, M., Haran, B., Fan, S. S. C., Yin, Y., Holfeld, C., Techel, J., Peters. J. H., Bouten, S., Lee, B., Pierson, B., Kessels, B., Routh, R., Cummings, K., "EUV lithography at the 22 nm technology node", Proc. SPIE 7636, 76361M (2010).
5. Bianucci, G., Cassol, G. L., Kools, J., Prea, M., Salmaso, G., Valsecchi, G., Zocchi, F. E., Bolshukhin, D., Schürmann, M., Schriever, G., "Design and fabrication consideration of EUVL collectors for HVM", Proc. SPIE 7271, 72710C (2009).
6. Bianucci, G., "Development and performance of grazing and normal incidence collectors for the HVM DPP and LPP sources", 2009 International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic, (2009).
7. Corthout, M., Apez, R., Brudermann, J., Damen, M., Derra, G., Franken, O., Jonkers, J., Klein, J., Kupper, F., Mader, A., Neff, W., Scheuermann, H., Schriever, G., Schürmann, M., Siemons, G., Snijkers, R., Vaudrevange, D., Wagenaars, E., van de Wel, P., Yoshioka, M., Zink, P., Zitzen, O., "Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM", Proc. SPIE 6921, 692131 (2008).
8. Corthout, M., Yoshioka M., "Sn DPP SoCoMo Integration", 2009 International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic, (2009).
9. Corthout, M., Teramoto Y., Yoshioka M., First Tin Beta SoCoMo ready for Wafer Exposure", 2010 International Symposium on Extreme Ultraviolet Lithography, Kobe, Japan, (2010).
10. Zink, P., Zocchi, F. E., Mader, A., Bianucci, G., Cassol, G.L., Gery, J.M., Franken, O., Apetz, R., Bergmann, K., Scheuermann, H., "Thermal and Optical Characterization of an Integrated Alpha Level Source, Debris Mitigation and Collector System", 2007 International Symposium on Extreme Ultraviolet Lithography, Sapporo, Japan, (2007).
11. Hinze, U., Chichkov, B., Feigl, T., Zeitner, U., Damm, C., Bolshukhin, D., Kleinschmidt, J., Schriever, G., Schürmann, M. C., "Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer," Proc. SPIE 6921, 6921123 (2008).