Sn DPP source-collector modules: Status of Alpha sources, Beta developments and the scalability to HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Corthout, Marc ^a   Apetz, Rolf ^a   Brudermann, Jesko ^d   Damen, Marcel ^a   Derra, Günther ^c   Franken, Oliver ^b   Jonkers, Jeroen ^a   Klein, Jürgen ^b   Küpper, Felix ^b   Mader, Arnaud ^a   Neff, Willi ^b   Scheuermann, Hans ^a   Schriever, Guido ^d   Schürmann, Max ^d   Siemons, Guido ^a   Snijkers, Rob ^a   Vaudrevange, Dominik ^a   Wagenaars, Erik ^b   Van De Wei, Pieter ^a   Yoshioka, Masaki ^d   Zink, Peter ^a   Zitzen, Oliver ^a   more..

^a Philips Extreme UY GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

^d STREME Technologies GmbH   (Germany)

Author keywords

DPP; EUV Lithography; EUV source; Gas discharge plasma; Tin

Indexed keywords

13.5 NM; 32-NM NODE; ALPHA SOURCES; CENTRAL WAVELENGTH; DISCHARGE-PRODUCED PLASMAS; DPP; EUV SOURCE; EXTREME ULTRAVIOLET LIGHT SOURCES; EXTREME ULTRAVIOLETS; EXTREME UV; GAS DISCHARGE PLASMA; HIGH-POWER; PHILIPS; POWER LEVELS; PULSE ENERGIES; REPETITION FREQUENCY;

ELECTRIC DISCHARGES; EQUIPMENT; EXTREME ULTRAVIOLET LITHOGRAPHY; GAS DISCHARGE TUBES; LIGHT SOURCES;

TIN;

EID: 62449262244     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772633     Document Type: Conference Paper

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